UV-laser-induced etching and metal seeding on polymers; a surface characterization

ABSTRACTA quartz crystal microbalance (QCM) has been used to study the 248 nm laser-induced etching of nickel by Br2. The experiment consists of focusing a pulsed UV laser beam at normal incidence onto the surface of a quartz crystal coated with 1μm of polycrystalline nickel. Absolute etch rates of nickel, in terms of mass removed per unit time, are determined from the integrated sensitivity function of the 6Mhz crystals used in this work. The dependence of the etch rate on Br2 pressure and laser fluence was measured. The kinetic data obtained from these measurements show that the mechanism of the etching process is dominated by the formation and the subsequent removal of a NixBry monolayer.

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Enhancement of UV laser induced etching of diamond under vacuum

14th Pacific Rim Conference on Lasers and Electro-Optics (CLEO PR 2020) ◽

10.1364/cleopr.2020.c12a_2 ◽

2020 ◽

Author(s):

C. G. Baldwin ◽

J. E. Downes ◽

R. P. Mildren

Keyword(s):

Uv Laser ◽

Laser Induced Etching

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Uv Laser-Induced Etching of the First-Row Transition Metals

MRS Proceedings ◽

10.1557/proc-158-47 ◽

1989 ◽

Vol 158 ◽

Author(s):

George W. Tyndall

Keyword(s):

Transition Metals ◽

Laser Beam ◽

Quartz Crystal Microbalance ◽

Laser Fluence ◽

Quartz Crystal ◽

Normal Incidence ◽

Uv Laser ◽

Polycrystalline Metal ◽

Kinetic Information ◽

Laser Induced Etching

ABSTRACTThe 248 nm excimer laser-induced etching of Ti, Cr, Fe, Co, Ni, and Cu by Br2 has been studied. The experiment consists of focusing the pulsed UV laser beam at normal incidence onto the surface of a quartz crystal microbalance (QCM) coated with 1μm of polycrystalline metal. Absolute etch rates are determined as a function of the Br2 pressure and the laser fluence. On the basis of the kinetic information, four mechanisms are proposed to explain the etching of these transition metals.

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Enhanced etch rate of deep-UV laser induced etching of diamond in low pressure conditions

Applied Physics Letters ◽

10.1063/5.0020405 ◽

2020 ◽

Vol 117 (11) ◽

pp. 111601 ◽

Cited By ~ 1

Author(s):

C. G. Baldwin ◽

J. E. Downes ◽

R. P. Mildren

Keyword(s):

Etch Rate ◽

Low Pressure ◽

Uv Laser ◽

Deep Uv ◽

Laser Induced Etching

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The Use of Advanced Analytical Techniques for Characterization of the Chemical, Physical, and Crystallographic Nature of a Surface

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100071107 ◽

1973 ◽

Vol 31 ◽

pp. 132-133 ◽

Cited By ~ 1

Author(s):

R. E. Herfert

Keyword(s):

Surface Characterization ◽

Analytical Techniques ◽

X Ray Diffraction ◽

Depth Of Penetration ◽

X Ray ◽

The Past ◽

Transmission Electron ◽

Scanning Electron

Studies of the nature of a surface, either metallic or nonmetallic, in the past, have been limited to the instrumentation available for these measurements. In the past, optical microscopy, replica transmission electron microscopy, electron or X-ray diffraction and optical or X-ray spectroscopy have provided the means of surface characterization. Actually, some of these techniques are not purely surface; the depth of penetration may be a few thousands of an inch. Within the last five years, instrumentation has been made available which now makes it practical for use to study the outer few 100A of layers and characterize it completely from a chemical, physical, and crystallographic standpoint. The scanning electron microscope (SEM) provides a means of viewing the surface of a material in situ to magnifications as high as 250,000X.

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