DC reactive magnetron sputter deposition of (111) textured TiN films — influence of nitrogen flow and discharge power on the texture formation
2000 ◽
Vol 127
(2-3)
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pp. 144-154
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2016 ◽
Vol 34
(4)
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pp. 041517
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2018 ◽
Vol 349
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pp. 529-539
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Keyword(s):
1993 ◽
Vol 8
(10)
◽
pp. 2613-2616
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2010 ◽
Vol 39
(8)
◽
pp. 1146-1151
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