High-temperature oxidation resistance of Cr1−Al N thin films deposited by reactive magnetron sputtering

2003 ◽  
Vol 163-164 ◽  
pp. 57-61 ◽  
Author(s):  
O Banakh ◽  
P.E Schmid ◽  
R Sanjinés ◽  
F Lévy
Keyword(s):  
Thin Films ◽  
High Temperature ◽  
Magnetron Sputtering ◽  
Oxidation Resistance ◽  
High Temperature Oxidation ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Temperature Oxidation

Structure and high temperature oxidation of Zr(1-x)Mo(x)N thin films deposited by reactive magnetron sputtering

2019 ◽  
Vol 485 ◽  
pp. 490-495 ◽  
Author(s):  
V.F.D. Soares ◽  
D.A.R. Fernandez ◽  
A.S. Fontes Junior ◽  
R.G. Carvalho ◽  
R. Machado ◽  
...  
Keyword(s):  
Thin Films ◽  
High Temperature ◽  
Magnetron Sputtering ◽  
High Temperature Oxidation ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Temperature Oxidation

scholarly journals Improving the high-temperature oxidation resistance of TiB2 thin films by alloying with Al

2020 ◽  
Vol 196 ◽  
pp. 677-689 ◽  
Author(s):  
Babak Bakhit ◽  
Justinas Palisaitis ◽  
Jimmy Thörnberg ◽  
Johanna Rosen ◽  
Per O.Å. Persson ◽  
...  
Keyword(s):  
Thin Films ◽  
High Temperature ◽  
Oxidation Resistance ◽  
High Temperature Oxidation ◽  
Temperature Oxidation

scholarly journals High Temperature Oxidation Behaviors of CrNx and Cr-Si-N Thin Films at 1000 °C

Coatings ◽  
2019 ◽  
Vol 9 (9) ◽  
pp. 540 ◽  
Author(s):  
Bih-Show Lou ◽  
Yue-Chyuan Chang ◽  
Jyh-Wei Lee
Keyword(s):  
Thin Films ◽  
High Temperature ◽  
Oxide Layer ◽  
Oxidation Resistance ◽  
High Temperature Oxidation ◽  
Temperature Oxidation ◽  
X Ray ◽  
Oxidation Test ◽  
Parabolic Rate ◽  
Oxidation Behaviors

The high temperature oxidation performance of nitride thin films has become an important issue when they are used as protective coatings on dry cutting tools or on die casting molds. In this study, the high temperature oxidation behaviors of CrNx and Cr-Si-N thin films were investigated at 1000 °C for 6 h in ambient air. The CrNx and Cr-Si-N thin films were prepared by a bipolar asymmetric pulsed direct-current (DC) magnetron sputtering system. Cr-Si-N films with silicon content ranging from 3.9 to 12.2 at.% were deposited by adjusting the Si target power. A thermogravimeter was adopted to study the oxidation kinetics of thin films. The weight gains were measured to calculate the parabolic rate constants of thin films. X-ray diffraction, X-ray mapping, and Auger electron spectroscopy were employed to study the microstructure and elemental redistributions of oxidized thin films. The as-deposited CrNx and Cr-Si-N thin films consisted of CrN and Cr2N mixed phases. The faceted Cr2O3 surface oxides, porous inner oxide layer, and oxygen-containing CrSi2 phases were found for the CrN film after oxidation test. On the other hand, the Cr-Si-N film containing 12.2 at.% Si showed a dense surface oxide layer and a thick and compact nitride layer, which indicates its best oxidation resistance. The high temperature oxidation resistance of Cr-Si-N thin films was improved by increasing Si content, due to the amorphous matrix contained nanocomposite microstructure and the formation of amorphous silicon oxide to retard the diffusion paths of oxygen, chromium, silicon, and nitrogen. The lowest parabolic rate constant of 1.48 × 10–2 mg2/cm4/h was obtained for the 12.2 at.% Si contained Cr-Si-N thin films, which provided the best oxidation resistance at 1000 °C for 6 h in this work. It should be noted that the residual tensile stress of thin film had a detrimental effect on the adhesion property during the oxidation test.

Microstructure and Oxidation Resistance of TiN Coatings

2013 ◽  
Vol 750-752 ◽  
pp. 2092-2095 ◽  
Author(s):  
Guo Zheng Nie ◽  
Chun Liang Zhong ◽  
Lan E Luo ◽  
Ren Long Zhou ◽  
Qiang Liu
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Oxidation Resistance ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
Tin Coating ◽  
X Ray ◽  
Tin Coatings ◽  
Cubic Structure

A series of TiN coatings were deposited by reactive magnetron sputtering with different target powers and different N2flows. The microstructure and oxidation resistance of TiN coatings were characterized by X-ray diffraction (XRD). The hardness of the thin films was characterized respectively with the nanoindentor. The effect of target powers and the N2flows on the microstructure, the hardness and oxidation resistance was studied. It was found that TiN coating deposited at different target powers and different N2flows exhibits a cubic structure with (1 1 1) preferred orientations, and the hardness of TiN coatings is 1200. The oxidation resistance of the TiN coatings is approximately 500°C.

AK STEEL 441

Alloy Digest ◽  
2006 ◽  
Vol 55 (6) ◽  
Keyword(s):  
Stainless Steel ◽  
Corrosion Resistance ◽  
High Temperature ◽  
Tensile Properties ◽  
Oxidation Resistance ◽  
Ferritic Stainless Steel ◽  
High Temperature Oxidation ◽  
High Temperature Strength ◽  
Temperature Oxidation ◽  
Temperature Performance

Abstract AK Steel 441 has good high-temperature strength, an equiaxed microstructure, and good high-temperature oxidation resistance. The alloy is a niobium-bearing ferritic stainless steel. This datasheet provides information on composition, hardness, and tensile properties as well as deformation. It also includes information on high temperature performance and corrosion resistance as well as forming and joining. Filing Code: SS-965. Producer or source: AK Steel.

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