Microstructure of titanium nitride thin films controlled by ion bombardment in a magnetron-sputtering device

R. Černý; R. Kužel; V. Valvoda; S. Kadlec; J. Musil

doi:10.1016/s0257-8972(09)90011-1

Microstructure of titanium nitride thin films controlled by ion bombardment in a magnetron-sputtering device

Surface and Coatings Technology ◽

10.1016/s0257-8972(09)90011-1 ◽

1994 ◽

Vol 64 (2) ◽

pp. 111-117 ◽

Cited By ~ 12

Author(s):

R. Černý ◽

R. Kužel ◽

V. Valvoda ◽

S. Kadlec ◽

J. Musil

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Titanium Nitride ◽

Ion Bombardment

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Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2005.08.214 ◽

2006 ◽

Vol 494 (1-2) ◽

pp. 146-150 ◽

Cited By ~ 43

Author(s):

M. Benegra ◽

D.G. Lamas ◽

M.E. Fernández de Rapp ◽

N. Mingolo ◽

A.O. Kunrath ◽

...

Keyword(s):

Thin Films ◽

Residual Stresses ◽

Magnetron Sputtering ◽

Titanium Nitride ◽

Direct Current ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Pulsed Direct Current

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RETRACTED ARTICLE: Nanocharacterization of Titanium Nitride Thin Films Obtained by Reactive Magnetron Sputtering

JOM ◽

10.1007/s11837-015-1460-2 ◽

2015 ◽

Vol 69 (8) ◽

pp. 1455-1455

Author(s):

Violeta Valentina Merie ◽

Marius Sorin Pustan ◽

Corina Bîrleanu ◽

Gavril Negrea

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Titanium Nitride ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Retracted Article

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Photoluminescence from Boron-Doped Titanium Nitride Nanocomposite Thin Films Prepared by the Magnetron Sputtering Method

Journal of the American Ceramic Society ◽

10.1111/j.1551-2916.2007.02040.x ◽

2007 ◽

Vol 0 (0) ◽

pp. 070916231959001-???

Author(s):

Sheng-Guo Lu ◽

Yong-Hao Lu ◽

Zheng-Kui Xu ◽

Kwok-Wai Cheah

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Titanium Nitride ◽

Boron Doped ◽

Nanocomposite Thin Films

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Comment on: “Characterization of Microroughness Parameters in Titanium Nitride Thin Films Grown by DC Magnetron Sputtering” [J Fusion Energ DOI 10.1007/s10894-012-9510-z]

Journal of Fusion Energy ◽

10.1007/s10894-012-9534-4 ◽

2012 ◽

Vol 31 (6) ◽

pp. 591-591 ◽

Cited By ~ 25

Author(s):

Shahram Solaymani ◽

Atefeh Ghaderi ◽

Negin Beryani Nezafat

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Titanium Nitride ◽

Dc Magnetron Sputtering

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Effect of ion bombardment and substrate orientation on structure and properties of titanium nitride films deposited by unbalanced magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1460888 ◽

2002 ◽

Vol 20 (3) ◽

pp. 678-682 ◽

Cited By ~ 13

Author(s):

S. Guruvenket ◽

G. Mohan Rao

Keyword(s):

Magnetron Sputtering ◽

Titanium Nitride ◽

Ion Bombardment ◽

Structure And Properties ◽

Substrate Orientation ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Reactive magnetron sputtering of transparent conductive oxide thin films: Role of energetic particle (ion) bombardment

Journal of Materials Research ◽

10.1557/jmr.2011.428 ◽

2012 ◽

Vol 27 (5) ◽

pp. 765-779 ◽

Cited By ~ 84

Author(s):

Klaus Ellmer ◽

Thomas Welzel

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Energetic Particle ◽

Transparent Conductive Oxide ◽

Ion Bombardment ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Conductive Oxide ◽

Image Position

Abstract

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Structural and optical characterization of titanium nitride thin films deposited by magnetron sputtering

Powder Metallurgy and Advanced Materials ◽

10.21741/9781945291999-15 ◽

2018 ◽

Cited By ~ 1

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Titanium Nitride ◽

Optical Characterization

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Room temperature fabrication of titanium nitride thin films as plasmonic materials by high-power impulse magnetron sputtering

Optical Materials Express ◽

10.1364/ome.6.000540 ◽

2016 ◽

Vol 6 (2) ◽

pp. 540 ◽

Cited By ~ 17

Author(s):

Zih-Ying Yang ◽

Yi-Hsun Chen ◽

Bo-Huei Liao ◽

Kuo-Ping Chen

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Titanium Nitride ◽

High Power ◽

Room Temperature ◽

Plasmonic Materials

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Microstructure and hydrogen impermeability of titanium nitride thin films deposited by direct current reactive magnetron sputtering

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2016.06.278 ◽

2016 ◽

Vol 688 ◽

pp. 44-50 ◽

Cited By ~ 18

Author(s):

Tong Zhou ◽

Dawei Liu ◽

Ying Zhang ◽

Taoyuan Ouyang ◽

Jinping Suo

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Titanium Nitride ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Fiber textures of titanium nitride and hafnium nitride thin films deposited by off-normal incidence magnetron sputtering

Journal of Applied Physics ◽

10.1063/1.2980325 ◽

2008 ◽

Vol 104 (6) ◽

pp. 063519 ◽

Cited By ~ 8

Author(s):

D. Deniz ◽

J. M. E. Harper

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Titanium Nitride ◽

Normal Incidence ◽

Hafnium Nitride

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