Microwave plasma chemical vapour deposition of diamond like carbon thin films

Journal of Alloys and Compounds ◽

10.1016/s0925-8388(98)00601-x ◽

1998 ◽

Vol 278 (1-2) ◽

pp. 130-134 ◽

Author(s):

D.S Patil ◽

K Ramachandran ◽

N Venkatramani ◽

M Pandey ◽

S Venkateswaran ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Diamond Like Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Carbon Thin Films

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A Study of Diamond-Like Carbon Thin Films Prepared by Microwave Plasma Chemical Vapour Deposition

Plasma Science and Technology ◽

10.1088/1009-0630/9/4/13 ◽

2007 ◽

Vol 9 (4) ◽

pp. 444-447 ◽

Author(s):

Lai Xiuqiong ◽

Chen Junfang ◽

Fu Silie ◽

Li Wei ◽

Zhang Maoping ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Diamond Like Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Carbon Thin Films

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Preparation of (Tl, Bi, Pb)-Sr-Ca-Cu-O superconducting thin films by the mist microwave plasma chemical vapour deposition method

Journal of Materials Science Letters ◽

10.1007/bf00422674 ◽

1995 ◽

Vol 14 (23) ◽

pp. 1681-1683

Author(s):

N. Takahashi ◽

A. Koukitu ◽

H. Seki

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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As-grown preparation of Ag-doped Y-Ba-Cu-O superconducting thin films by mist microwave plasma chemical vapour deposition

Journal of Materials Science Letters ◽

10.1007/bf00270999 ◽

1995 ◽

Vol 14 (24) ◽

pp. 1757-1760 ◽

Author(s):

N. Takahashi ◽

A. Koukitu ◽

H. Seki

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Superconducting Thin Films ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Diamond Thin Films by Microwave Plasma Chemical Vapour Deposition Process

IETE Technical Review ◽

10.1080/02564602.1998.11416731 ◽

1998 ◽

Vol 15 (1-2) ◽

pp. 65-70

Author(s):

H C Barshilia ◽

V D Vankar

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Deposition Process ◽

Plasma Chemical ◽

Chemical Vapour Deposition Process ◽

Plasma Chemical Vapour Deposition ◽

Diamond Thin Films

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Preparation and characterization of Y-system superconducting thin films by mist microwave-plasma chemical vapour deposition

Journal of Materials Science ◽

10.1007/bf00355999 ◽

1996 ◽

Vol 31 (11) ◽

pp. 2897-2902

Author(s):

N. Takahashi ◽

A. Koukitu ◽

H. Seki

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Superconducting Thin Films ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Microwave plasma chemical vapour deposition of tetramethylsilane: correlations between optical emission spectroscopy and film characteristics

Surface and Coatings Technology ◽

10.1016/s0257-8972(01)01081-7 ◽

2001 ◽

Vol 142-144 ◽

pp. 314-320 ◽

Author(s):

L. Thomas ◽

L. Maillé ◽

J.M. Badie ◽

M. Ducarroir

Keyword(s):

Chemical Vapour Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Optical Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Film Characteristics

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MICROWAVE PLASMA CHEMICAL VAPOUR DEPOSITION OF DIAMOND: ITS GROWTH AND CHARACTERIZATION

Metallurgical Coatings and Thin Films 1990 ◽

10.1016/b978-1-85166-813-7.50013-9 ◽

1990 ◽

pp. 53-62

Author(s):

CHIA-FU CHEN ◽

KAZUHITO NISHIMURA ◽

ENSEI KO ◽

EIJI OGAWA ◽

SATORU HOSOMI ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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The temperature dependence of the resistance of diamond film synthesized by microwave plasma chemical vapour deposition method

Vacuum ◽

10.1016/0042-207x(91)91423-l ◽

1991 ◽

Vol 42 (16) ◽

pp. 1083

Author(s):

Yang Bangchao ◽

Gou Li ◽

Jia Yuming

Keyword(s):

Temperature Dependence ◽

Chemical Vapour Deposition ◽

Diamond Film ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Field emission characteristics of nano-sheet carbon films deposited by quartz-tube microwave plasma chemical vapour deposition

Chinese Physics B ◽

10.1088/1674-1056/17/4/053 ◽

2008 ◽

Vol 17 (4) ◽

pp. 1467-1471 ◽

Author(s):

Gu Guang-Rui ◽

Jin Zhe ◽

Ito Toshimichi

Keyword(s):

Field Emission ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Carbon Films ◽

Quartz Tube ◽

Emission Characteristics ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Thermoelectric power of polycrystalline Si films prepared by microwave plasma chemical vapour deposition

Thin Solid Films ◽

10.1016/0040-6090(96)08600-2 ◽

1996 ◽

Vol 281-282 ◽

pp. 159-161 ◽

Author(s):

So Yonekubo ◽

Kiichi Kamimura ◽

Yoshiharu Onuma

Keyword(s):

Thermoelectric Power ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

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