Gas Phase Chemical Processes

2021 ◽  
pp. 154-209
1987 ◽  
Vol 101 ◽  
Author(s):  
Ching-Hsong Wu

ABSTRACTA photochemical system of mercury-sensitized reactions between silane and ammonia was studied to elucidate the gas-phase chemical processes involved in photo-CVD of silicon nitride. Several transient intermediates were detected and identified as silylated amines by the mass spectrometric isotope labeling method. These compounds containing both Si and N atoms appeared to be the precursors of silicon nitride. The chemical characteristics of silylated amines were studied under different experimental conditions. The reactivity and possible reaction paths for the formation of silylamine are discussed.


2000 ◽  
Vol 197 ◽  
pp. 237-250 ◽  
Author(s):  
B. R. Rowe ◽  
C. Rebrion Rowe ◽  
A. Canosa

A review of the most recent experimental results concerning reaction kinetics at low temperatures is presented, most of them having been obtained using the CRESU technique. Some astrochemical consequences are also highlighted.


2016 ◽  
Vol 26 (2) ◽  
pp. 157-159 ◽  
Author(s):  
Ning Luo ◽  
Hong Wen Jing ◽  
Zhan Guo Ma ◽  
Weidong Liu ◽  
Liangchi Zhang ◽  
...  

1988 ◽  
Vol 26 (2) ◽  
pp. 559-572 ◽  
Author(s):  
Youichi Nakayama ◽  
Takayuki Takahagi ◽  
Fusami Soeda ◽  
Kenji Hatada ◽  
Shoji Nagaoka ◽  
...  

1999 ◽  
Vol 68 (3) ◽  
pp. 171-181 ◽  
Author(s):  
Evgenii N Chesnokov ◽  
Viktor N Panfilov

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