A Chemical Study of Photo-CVD of Silicon Nitride in Mercury-Sensitized Reactions Between Silane and Ammonia
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ABSTRACTA photochemical system of mercury-sensitized reactions between silane and ammonia was studied to elucidate the gas-phase chemical processes involved in photo-CVD of silicon nitride. Several transient intermediates were detected and identified as silylated amines by the mass spectrometric isotope labeling method. These compounds containing both Si and N atoms appeared to be the precursors of silicon nitride. The chemical characteristics of silylated amines were studied under different experimental conditions. The reactivity and possible reaction paths for the formation of silylamine are discussed.
2000 ◽
Vol 197
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pp. 237-250
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2004 ◽
Vol 109
(D23)
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2005 ◽
Vol 70
(11)
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pp. 1769-1786
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2006 ◽
Vol 84
(5)
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pp. 1128-1133
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2016 ◽
Vol 26
(2)
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pp. 157-159
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1988 ◽
Vol 26
(2)
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pp. 559-572
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