Characterization of Ultra-Thin Hf-based Alternative Dielectric Layers for Si CMOS by Z-contrast Imaging and Electron Energy-Loss Spectroscopy in STEM
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Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.
2000 ◽
Vol 130
(1-2)
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pp. 71-80
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2002 ◽
Vol 51
(suppl 1)
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pp. S59-S66
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1985 ◽
Vol 3
(3)
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pp. 1313-1314
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