Embedding-Free Method for Preparation of Cross-Sections of Organic Materials for Micro Chemical Analysis Using Gas Cluster Ion Beam Sputtering

Thein situPES – Ar GCIB sputtering combined analysis enable to characterize the persistence of controlled energy-level at organic semiconductor/electrode interfaces.

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Auger electron nanoscale mapping and x-ray photoelectron spectroscopy combined with gas cluster ion beam sputtering to study an organic bulk heterojunction

Applied Physics Letters ◽

10.1063/1.4885115 ◽

2014 ◽

Vol 104 (24) ◽

pp. 243303 ◽

Cited By ~ 5

Author(s):

Seong Heon Kim ◽

Sung Heo ◽

Soo-Ghang Ihn ◽

Sungyoung Yun ◽

Jong Hwan Park ◽

...

Keyword(s):

Photoelectron Spectroscopy ◽

Auger Electron ◽

Bulk Heterojunction ◽

Ion Beam ◽

Ion Beam Sputtering ◽

X Ray ◽

Beam Sputtering ◽

Cluster Ion ◽

Gas Cluster Ion Beam

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Direct analytical method of contact position effects on the energy-level alignments at organic semiconductor/electrode interfaces using photoemission spectroscopy combined with Ar gas cluster ion beam sputtering

Nanotechnology ◽

10.1088/0957-4484/26/46/465704 ◽

2015 ◽

Vol 26 (46) ◽

pp. 465704 ◽

Cited By ~ 6

Author(s):

Dong-Jin Yun ◽

JaeGwan Chung ◽

Seong Heon Kim ◽

Yongsu Kim ◽

SungHoon Park ◽

...

Keyword(s):

Ion Beam ◽

Photoemission Spectroscopy ◽

Ion Beam Sputtering ◽

Position Effects ◽

Beam Sputtering ◽

Cluster Ion ◽

Semiconductor Electrode ◽

Gas Cluster Ion Beam ◽

Ar Gas ◽

Contact Position

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Structural analysis of the outermost hair surface using TOF-SIMS with gas cluster ion beam sputtering

Biointerphases ◽

10.1116/1.4940770 ◽

2016 ◽

Vol 11 (2) ◽

pp. 02A315 ◽

Cited By ~ 6

Author(s):

Kazutaka lshikawa ◽

Masayuki Okamoto ◽

Satoka Aoyagi

Keyword(s):

Structural Analysis ◽

Ion Beam ◽

Ion Beam Sputtering ◽

Tof Sims ◽

Beam Sputtering ◽

Cluster Ion ◽

Gas Cluster Ion Beam ◽

Hair Surface

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An electronic structure reinterpretation of the organic semiconductor/electrode interface based on argon gas cluster ion beam sputtering investigations

Journal of Applied Physics ◽

10.1063/1.4812582 ◽

2013 ◽

Vol 114 (1) ◽

pp. 013703 ◽

Cited By ~ 18

Author(s):

Dong-Jin Yun ◽

JaeGwan Chung ◽

Changhoon Jung ◽

Ki-Hong Kim ◽

WoonJoong Baek ◽

...

Keyword(s):

Electronic Structure ◽

Organic Semiconductor ◽

Ion Beam ◽

Ion Beam Sputtering ◽

Argon Gas ◽

Beam Sputtering ◽

Cluster Ion ◽

Electrode Interface ◽

Semiconductor Electrode ◽

Gas Cluster Ion Beam

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Damage-Free Photoemission Study of Conducting Carbon Composite Electrode Using Ar Gas Cluster Ion Beam Sputtering Process

Journal of The Electrochemical Society ◽

10.1149/2.011207jes ◽

2012 ◽

Vol 159 (7) ◽

pp. H626-H632 ◽

Cited By ~ 28

Author(s):

Dong-Jin Yun ◽

Changhoon Jung ◽

Hyung-Ik Lee ◽

Ki-Hong Kim ◽

Yong Koo Kyoung ◽

...

Keyword(s):

Composite Electrode ◽

Ion Beam ◽

Carbon Composite ◽

Ion Beam Sputtering ◽

Beam Sputtering ◽

Cluster Ion ◽

Carbon Composite Electrode ◽

Gas Cluster Ion Beam ◽

Ar Gas ◽

Photoemission Study

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Direct characterization of graphene doping state by in situ photoemission spectroscopy with Ar gas cluster ion beam sputtering

Physical Chemistry Chemical Physics ◽

10.1039/c7cp06450k ◽

2018 ◽

Vol 20 (1) ◽

pp. 615-622 ◽

Cited By ~ 7

Author(s):

Dong-Jin Yun ◽

Seyun Kim ◽

Changhoon Jung ◽

Chang-Seok Lee ◽

Hiesang Sohn ◽

...

Keyword(s):

Ion Beam ◽

Photoemission Spectroscopy ◽

Ion Beam Sputtering ◽

Graphene Doping ◽

Beam Sputtering ◽

Diagnosis Method ◽

Cluster Ion ◽

Gas Cluster Ion Beam ◽

Ar Gas

We propose a novel, direct diagnosis method for graphene doping states at organic semiconductor/electrode interfaces by an in situ photoemission spectroscopy method.

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