Atomic Layer Deposition-Derived Nanomaterials: Oxides, Transition Metal Dichalcogenides, and Metal–Organic Frameworks

2020 ◽  
Vol 32 (21) ◽  
pp. 9056-9077
Author(s):  
Zhiwei Zhang ◽  
Yuting Zhao ◽  
Zhe Zhao ◽  
Gaoshan Huang ◽  
Yongfeng Mei
Keyword(s):  
Transition Metal ◽  
Atomic Layer Deposition ◽  
Metal Organic Frameworks ◽  
Transition Metal Dichalcogenides ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Metal Dichalcogenides ◽  
Metal Organic

Recent Progress in Atomic Layer Deposition of Multifunctional Oxides and Two-Dimensional Transition Metal Dichalcogenides

2016 ◽  
Vol 04 (04) ◽  
pp. 1640010 ◽  
Author(s):  
Hongfei Liu
Keyword(s):  
Thin Films ◽  
Transition Metal ◽  
Atomic Layer Deposition ◽  
Recent Progress ◽  
Transition Metal Dichalcogenides ◽  
Atomic Layer ◽  
Two Dimensional ◽  
Layer Deposition ◽  
Metal Dichalcogenides ◽  
Multifunctional Oxides

Atomic layer deposition (ALD) has long been developed for conformal coating thin films on planar surfaces and complex structured substrates based on its unique sequential process and self-limiting surface chemistry. In general, the coated thin films can be dielectrics, semiconductors, conductors, metals, etc., while the targeted surface can vary from those of particles, wires, to deep pores, through holes, and so on. The ALD coating technique, itself, was developed from gas-phase chemical vapor deposition, but now it has been extended even to liquid phase coating/growth. Because the thickness of ALD growth is controlled in atomic level ([Formula: see text]0.1[Formula: see text]nm), it has recently been employed for producing two-dimensional (2D) materials, typically semiconducting nanosheets of transition metal dichalcogenides (TMDCs). In this paper, we briefly introduce recent progress in ALD of multifunctional oxides and 2D TMDCs with the focus being placed on suitable ALD precursors and their ALD processes (for both binary compounds and ternary alloys), highlighting the remaining challenges and promising potentials.

scholarly journals Combining nanoparticles grown by ALD and MOFs for gas separation and catalysis applications

2020 ◽  
Vol 92 (2) ◽  
pp. 213-222 ◽  
Author(s):  
Matthieu Weber ◽  
Mikhael Bechelany
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Gas Separation ◽  
Vapor Phase ◽  
Metallic Nanoparticles ◽  
Metal Organic Frameworks ◽  
Atomic Layer ◽  
Chemical Processes ◽  
Layer Deposition ◽  
Metal Organic

AbstractSupported metallic nanoparticles (NPs) are essential for many important chemical processes. In order to implement precisely tuned NPs in miniaturized devices by compatible processes, novel nanoengineering routes must be explored. Atomic layer deposition (ALD), a scalable vapor phase technology typically used for the deposition of thin films, represents a promising new route for the synthesis of supported metallic NPs. Metal–organic frameworks (MOFs) are a new exciting class of crystalline porous materials that have attracted much attention in the recent years. Since the size of their pores can be precisely adjusted, these nanomaterials permit highly selective separation and catalytic processes. The combination of NPs and MOF is an emerging area opening numbers of applications, which still faces considerable challenges, and new routes need to be explored for the synthesis of these NPs/MOF nanocomposites. The aim of this paper is double: first, it aims to briefly present the ALD route and its use for the synthesis of metallic NPs. Second, the combination of ALD-grown NPs and MOFs has been explored for the synthesis of Pd NPs/MOF ZIF-8, and several selected examples were ALD-grown NPs and MOFs have been combined and applied gas separation and catalysis will be presented.

scholarly journals Isomerization and Selective Hydrogenation of Propyne: Screening of Metal–Organic Frameworks Modified by Atomic Layer Deposition

2020 ◽  
Vol 142 (48) ◽  
pp. 20380-20389
Author(s):  
Ryan A. Hackler ◽  
Riddhish Pandharkar ◽  
Magali S. Ferrandon ◽  
In Soo Kim ◽  
Nicolaas A. Vermeulen ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Selective Hydrogenation ◽  
Metal Organic Frameworks ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Metal Organic

Two-dimensional transition metal dichalcogenides as metal sources of metal–organic frameworks

2018 ◽  
Vol 54 (29) ◽  
pp. 3664-3667 ◽  
Author(s):  
Yanwei Sun ◽  
Shen Hu ◽  
Chunshan Song ◽  
Shu Miao ◽  
Zhou Jiang ◽  
...  
Keyword(s):  
Transition Metal ◽  
Metal Organic Frameworks ◽  
Transition Metal Dichalcogenides ◽  
Two Dimensional ◽  
Metal Sources ◽  
Metal Precursors ◽  
Metal Dichalcogenides ◽  
Metal Organic

It was found that transition metal dichalcogenides could serve as competent metal precursors of metal–organic frameworks with several obvious advantages.

scholarly journals Regioselective Atomic Layer Deposition in Metal–Organic Frameworks Directed by Dispersion Interactions

2016 ◽  
Vol 138 (41) ◽  
pp. 13513-13516 ◽  
Author(s):  
Leighanne C. Gallington ◽  
In Soo Kim ◽  
Wei-Guang Liu ◽  
Andrey A. Yakovenko ◽  
Ana E. Platero-Prats ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Organic Frameworks ◽  
Atomic Layer ◽  
Dispersion Interactions ◽  
Layer Deposition ◽  
Metal Organic
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