Temperature-Dependent Ultrafast Solvation Response and Solute Diffusion in Acetamide–Urea Deep Eutectic Solvent

It is well known that a number of compound superconductors with the A15 structure undergo a martensite transformation when cooled to the superconducting state. Nb3Sn is one of those compounds that transforms, at least partially, from a cubic to tetragonal structure near 43 K. To our knowledge this transformation in Nb3Sn has not been studied by TEM. In fact, the only low temperature TEM study of an A15 material, V3Si, was performed by Goringe and Valdre over 20 years ago. They found the martensite structure in some foil areas at temperatures between 11 and 29 K, accompanied by faults that consisted of coherent twin boundaries on {110} planes. In pursuing our studies of irradiation defects in superconductors, we are the first to observe by TEM a similar martensite structure in Nb3Sn.Samples of Nb3Sn suitable for TEM studies have been produced by both a liquid solute diffusion reaction and by sputter deposition of thin films.

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(111) Monocrystalline Nickel Films

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100095819 ◽

1972 ◽

Vol 30 ◽

pp. 512-513

Author(s):

T.E. Pratt ◽

R.W. Vook

Keyword(s):

Film Thickness ◽

Deposition Rate ◽

Room Temperature ◽

Narrow Range ◽

High Vacuum ◽

Residual Pressure ◽

Temperature Dependent ◽

Deposition Parameters ◽

Transmission Electron ◽

Substrate Temperatures

(111) oriented thin monocrystalline Ni films have been prepared by vacuum evaporation and examined by transmission electron microscopy and electron diffraction. In high vacuum, at room temperature, a layer of NaCl was first evaporated onto a freshly air-cleaved muscovite substrate clamped to a copper block with attached heater and thermocouple. Then, at various substrate temperatures, with other parameters held within a narrow range, Ni was evaporated from a tungsten filament. It had been shown previously that similar procedures would yield monocrystalline films of CU, Ag, and Au.For the films examined with respect to temperature dependent effects, typical deposition parameters were: Ni film thickness, 500-800 A; Ni deposition rate, 10 A/sec.; residual pressure, 10-6 torr; NaCl film thickness, 250 A; and NaCl deposition rate, 10 A/sec. Some additional evaporations involved higher deposition rates and lower film thicknesses.Monocrystalline films were obtained with substrate temperatures above 500° C. Below 450° C, the films were polycrystalline with a strong (111) preferred orientation.

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Solute redistribution during in-situ irradiation of alloys in the high voltage electron microscope

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100108994 ◽

1978 ◽

Vol 36 (1) ◽

pp. 370-371

Author(s):

P. R. Okamoto ◽

N.Q. Lam ◽

R. L. Lyles

Keyword(s):

Electron Microscope ◽

High Voltage ◽

Driving Forces ◽

Solute Diffusion ◽

Solute Redistribution ◽

Voltage Electron ◽

High Voltage Electron Microscope ◽

High Voltage Electron ◽

Thin Foils ◽

Solute Atoms

During irradiation of thin foils in a high voltage electron microscope (HVEM) defect gradients will be set up between the foil surfaces and interior. In alloys defect gradients provide additional driving forces for solute diffusion since any preferential binding and/or exchange between solute atoms and mobile defects will couple a net flux of solute atoms to the defect fluxes. Thus, during irradiation large nonequilibrium compositional gradients can be produced near the foil surfaces in initially homogeneous alloys. A system of coupled reaction-rate and diffusion equations describing the build up of mobile defects and solute redistribution in thin foils and in a semi-infinite medium under charged-particle irradiation has been formulated. Spatially uniform and nonuniform damage production rates have been used to model solute segregation under electron and ion irradiation conditions.An example calculation showing the time evolution of the solute concentration in a 2000 Å thick foil during electron irradiation is shown in Fig. 1.

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