Trickle Flow Aided Atomic Layer Deposition (ALD) Strategy for Ultrathin Molybdenum Disulfide (MoS2) Synthesis

2019 ◽  
Vol 11 (39) ◽  
pp. 36270-36277 ◽  
Author(s):  
Junjie Yang ◽  
Lei Liu
Keyword(s):  
Atomic Layer Deposition ◽  
Molybdenum Disulfide ◽  
Atomic Layer ◽  
Layer Deposition

Atomic layer deposited molybdenum disulfide on Si photocathodes for highly efficient photoelectrochemical water reduction reaction

2017 ◽  
Vol 5 (7) ◽  
pp. 3304-3310 ◽  
Author(s):  
Seungtaeg Oh ◽  
Jun Beom Kim ◽  
Jun Tae Song ◽  
Jihun Oh ◽  
Soo-Hyun Kim
Keyword(s):  
Atomic Layer Deposition ◽  
Molybdenum Disulfide ◽  
Low Cost ◽  
Atomic Layer ◽  
Reduction Reaction ◽  
Water Reduction ◽  
Noble Metal Catalysts ◽  
Highly Efficient ◽  
Layer Deposition ◽  
Earth Abundant

MoS2 is an earth-abundant and low-cost HER electrocatalyst that can substitute noble metal catalysts. Here, we develop the atomic layer deposition (ALD) of MoS2 nanomaterials on p-Si photocathodes for highly efficient and stable PEC water reduction reactions.

scholarly journals Atomic layer deposition of molybdenum disulfide films using MoF6 and H2S

2018 ◽  
Vol 36 (1) ◽  
pp. 01A125 ◽  
Author(s):  
Anil U. Mane ◽  
Steven Letourneau ◽  
David J. Mandia ◽  
Jian Liu ◽  
Joseph A. Libera ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Molybdenum Disulfide ◽  
Atomic Layer ◽  
Layer Deposition

Wafer-Scale Synthesis of Reliable High-Mobility Molybdenum Disulfide Thin Films via Inhibitor-Utilizing Atomic Layer Deposition

2017 ◽  
Vol 29 (47) ◽  
pp. 1703031 ◽  
Author(s):  
Woojin Jeon ◽  
Yeonchoo Cho ◽  
Sanghyun Jo ◽  
Ji-Hoon Ahn ◽  
Seong-Jun Jeong
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Molybdenum Disulfide ◽  
High Mobility ◽  
Atomic Layer ◽  
Wafer Scale ◽  
Layer Deposition

scholarly journals Structural Evolution of Molybdenum Disulfide Prepared by Atomic Layer Deposition for Realization of Large Scale Films in Microelectronic Applications

2018 ◽  
Vol 1 (8) ◽  
pp. 4028-4037 ◽  
Author(s):  
Steven Letourneau ◽  
Matthias J. Young ◽  
Nicholas M. Bedford ◽  
Yang Ren ◽  
Angel Yanguas-Gil ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Molybdenum Disulfide ◽  
Large Scale ◽  
Structural Evolution ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals First-Principles Studies of Nucleation of Atomic-Layered Molybdenum Disulfide by Atomic Layer Deposition

2021 ◽  
Author(s):  
Matthew Lawson
Keyword(s):  
Atomic Layer Deposition ◽  
Molybdenum Disulfide ◽  
First Principles ◽  
Density Functional ◽  
Atomic Layer ◽  
Atomic Scale ◽  
Half Cycle ◽  
Scale Thickness ◽  
Layer Deposition ◽  
Nucleation Mechanisms

This dissertation implements first-principles calculations to understand the nucleation mechanisms for atomic layer deposition (ALD) of molybdenum disulfide (MoS2) using MoF6 and H2S precursors. ALD is a self-limiting process that can deposit a range of materials at the nanoscale, while maintaining chemical stoichiometry, atomic scale thickness control, and can conform to high-aspect ratio substrate designs. ALD is extremely sensitive to surface chemistry and morphology; therefore, it is critical to understand how these factors control deposition. Density functional theory (DFT) was used to understand what factors can control the nucleation for ALD of MoS2 using MoF6 and H2S. Surface hydroxyls on oxide substrates help facilitate the formation of ionic MFx (M = metal, x = 1, 2, 3) species, which thermodynamically drive the first-half cycle of ALD. DFT calculations were supported by experimental measurements to validate computational predictions. DFT and experiment both confirmed that there are different types of nucleation mechanisms during ALD of MoS2. The types of mechanisms depend on which precursor is introduced, and highlights the complexities during nucleation of MoS2 during ALD.

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