scholarly journals Single-Crystal Silicon Optical Fiber by Direct Laser Crystallization

ACS Photonics ◽  
2016 ◽  
Vol 4 (1) ◽  
pp. 85-92 ◽  
Author(s):  
Xiaoyu Ji ◽  
Shiming Lei ◽  
Shih-Ying Yu ◽  
Hiu Yan Cheng ◽  
Wenjun Liu ◽  
...  
Keyword(s):  
Optical Fiber ◽  
Single Crystal ◽  
Single Crystal Silicon ◽  
Laser Crystallization ◽  
Crystal Silicon ◽  
Direct Laser

Analysis of Silicon-On-Insulator Structures Formed By Oxygen Ion Implantation

1985 ◽  
Vol 43 ◽  
pp. 300-301
Author(s):  
N. Lewis ◽  
E. L. Hall ◽  
A. Mogro-Campero ◽  
R. P. Love
Keyword(s):  
Ion Implantation ◽  
Single Crystal ◽  
Single Crystal Silicon ◽  
Silicon Layer ◽  
Device Fabrication ◽  
Silicon On Insulator ◽  
High Dose ◽  
Crystal Silicon ◽  
Oxygen Ion ◽  
Oxygen Ion Implantation

The formation of buried oxide structures in single crystal silicon by high-dose oxygen ion implantation has received considerable attention recently for applications in advanced electronic device fabrication. This process is performed in a vacuum, and under the proper implantation conditions results in a silicon-on-insulator (SOI) structure with a top single crystal silicon layer on an amorphous silicon dioxide layer. The top Si layer has the same orientation as the silicon substrate. The quality of the outermost portion of the Si top layer is important in device fabrication since it either can be used directly to build devices, or epitaxial Si may be grown on this layer. Therefore, careful characterization of the results of the ion implantation process is essential.

Material removal and surface evolution of single crystal silicon during ion beam polishing

2021 ◽  
pp. 148954
Author(s):  
Hang Xiao ◽  
Yifan Dai ◽  
Jian Duan ◽  
Ye Tian ◽  
Jia Li
Keyword(s):  
Single Crystal ◽  
Material Removal ◽  
Ion Beam ◽  
Single Crystal Silicon ◽  
Crystal Silicon ◽  
Surface Evolution
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