scholarly journals Real-Time Observation of Atomic Layer Deposition Inhibition: Metal Oxide Growth on Self-Assembled Alkanethiols

2014 ◽  
Vol 6 (15) ◽  
pp. 11891-11898 ◽  
Author(s):  
Jason R. Avila ◽  
Erica J. DeMarco ◽  
Jonathan D. Emery ◽  
Omar K. Farha ◽  
Michael J. Pellin ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxide ◽  
Real Time ◽  
Atomic Layer ◽  
Oxide Growth ◽  
Layer Deposition ◽  
Self Assembled ◽  
Time Observation ◽  
Real Time Observation

Trap states in AlGaN/GaN metal-oxide-semiconductor structures with Al2O3 prepared by atomic layer deposition

2010 ◽  
Vol 107 (10) ◽  
pp. 106104 ◽  
Author(s):  
D. Gregušová ◽  
R. Stoklas ◽  
Ch. Mizue ◽  
Y. Hori ◽  
J. Novák ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxide ◽  
Atomic Layer ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Trap States ◽  
Semiconductor Structures ◽  
Layer Deposition

scholarly journals Modifying hydrophilic properties of polyurethane acryl paint substrates by atomic layer deposition and self-assembled monolayers

RSC Advances ◽  
2020 ◽  
Vol 10 (57) ◽  
pp. 34333-34343
Author(s):  
D. Beitner ◽  
I. Polishchuk ◽  
E. Asulin ◽  
B. Pokroy
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Self Assembled Monolayers ◽  
Surface Wetting ◽  
Wetting Properties ◽  
Layer Deposition ◽  
Assembled Monolayers ◽  
Self Assembled

A process of atomic layer deposition (ALD) combined with self-assembled monolayers (SAMs) was used to investigate the possible modification of polyurethane (PUR) paint surface wetting properties without altering their original hue.

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