In Situ Reaction Mechanism Studies on Lithium Hexadimethyldisilazide and Ozone Atomic Layer Deposition Process for Lithium Silicate

2013 ◽  
Vol 117 (27) ◽  
pp. 14241-14246 ◽  
Author(s):  
Yoann Tomczak ◽  
Kjell Knapas ◽  
Markku Sundberg ◽  
Markku Leskelä ◽  
Mikko Ritala
Keyword(s):  
Reaction Mechanism ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
Lithium Silicate ◽  
Atomic Layer Deposition Process ◽  
In Situ Reaction ◽  
Layer Deposition

scholarly journals In Situ SiO2 Passivation of Epitaxial (100) and (110)InGaAs by Exploiting TaSiOx Atomic Layer Deposition Process

ACS Omega ◽  
2018 ◽  
Vol 3 (11) ◽  
pp. 14567-14574 ◽  
Author(s):  
Mantu K. Hudait ◽  
Michael B. Clavel ◽  
Jheng-Sin Liu ◽  
Shuvodip Bhattacharya
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

Optical in situ monitoring of plasma-enhanced atomic layer deposition process

2018 ◽  
Vol 57 (6S2) ◽  
pp. 06JF05 ◽  
Author(s):  
Muhammad Zeeshan Arshad ◽  
Kyung Jae Jo ◽  
Hyun Gi Kim ◽  
Sang Jeen Hong
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
In Situ Monitoring ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

scholarly journals In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3

2006 ◽  
Vol 89 (13) ◽  
pp. 131505 ◽  
Author(s):  
S. B. S. Heil ◽  
P. Kudlacek ◽  
E. Langereis ◽  
R. Engeln ◽  
M. C. M. van de Sanden ◽  
...  
Keyword(s):  
Reaction Mechanism ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
In Situ Reaction ◽  
Layer Deposition

In Situ Reaction Mechanism Studies on the New tBuN=M(NEt2)3 -Water and tBuN=M(NEt2)3 - Ozone (M = Nb,Ta) Atomic Layer Deposition Processes

2012 ◽  
Vol 24 (9) ◽  
pp. 1555-1561 ◽  
Author(s):  
Yoann Tomczak ◽  
Kjell Knapas ◽  
Markku Sundberg ◽  
Markku Leskelä ◽  
Mikko Ritala
Keyword(s):  
Reaction Mechanism ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
In Situ Reaction ◽  
Layer Deposition ◽  
Deposition Processes

In Situ Reaction Mechanism Studies on Atomic Layer Deposition of AlxSiyOz from Trimethylaluminium, Hexakis(ethylamino)disilane, and Water

2012 ◽  
Vol 24 (20) ◽  
pp. 3859-3867 ◽  
Author(s):  
Yoann Tomczak ◽  
Kjell Knapas ◽  
Suvi Haukka ◽  
Marianna Kemell ◽  
Mikko Heikkilä ◽  
...  
Keyword(s):  
Reaction Mechanism ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
In Situ Reaction ◽  
Layer Deposition
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