In Situ SiO2 Passivation of Epitaxial (100) and (110)InGaAs by Exploiting TaSiOx Atomic Layer Deposition Process
2018 ◽
Vol 57
(6S2)
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pp. 06JF05
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2013 ◽
Vol 117
(27)
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pp. 14241-14246
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2014 ◽
Vol 78
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pp. 1243-1253
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2020 ◽
Vol 38
(2)
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pp. 022418
2011 ◽
Vol 171
(1)
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pp. 345-349
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2017 ◽
Vol 35
(1)
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pp. 01B107
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