Facile Synthesis and Optical Property of Porous Tin Oxide and Europium-Doped Tin Oxide Nanorods through Thermal Decomposition of the Organotin

2008 ◽  
Vol 112 (50) ◽  
pp. 19939-19944 ◽  
Author(s):  
Weiqiang Fan ◽  
Shuyan Song ◽  
Jing Feng ◽  
Yongqian Lei ◽  
Guoli Zheng ◽  
...  
2019 ◽  
Vol 14 (8) ◽  
pp. 828-830 ◽  
Author(s):  
Weihua Meng ◽  
Weihong Wu ◽  
Weiwei Zhang ◽  
Luyao Cheng ◽  
Yunhong Jiao ◽  
...  

2011 ◽  
Vol 26 (2) ◽  
pp. 301-304 ◽  
Author(s):  
Tiekun Jia ◽  
Xiaofeng Wang ◽  
Weimin Wang ◽  
Yanling Dong ◽  
Guihua Liao ◽  
...  

RSC Advances ◽  
2014 ◽  
Vol 4 (29) ◽  
pp. 14872-14878 ◽  
Author(s):  
Huan Pang ◽  
Changyun Chen

A facile method is developed to synthesize cerium oxides with plate and brick morphologies by the thermal decomposition of nanostructured oxalate precursors.


1993 ◽  
Vol 8 (12) ◽  
pp. 3135-3144 ◽  
Author(s):  
Dennis Gallagher ◽  
Francis Scanlan ◽  
Raymond Houriet ◽  
Hans Jörg Mathieu ◽  
Terry A. Ring

In2O3–SnO2 films were produced by thermal decomposition of a deposit which was dip coated on borosilicate glass substrates from an acetylacetone solution of indium and tin acetoacetonate. Thermal analysis showed complete pyrolysis of the organics by 400 °C. The thermal decomposition reaction generated acetylacetone gas and was found to be first order with an activation energy of 13.6 Kcal/mole. Differences in thermal decomposition between the film and bulk materials were noted. As measured by differential scanning calorimetry using a 40 °C/min temperature ramp, the glass transition temperature of the deposited oxide film was found to be ∼462 °C, and the film crystallization temperature was found to be ∼518 °C. For film fabrication, thermal decomposition of the films was performed at 500 °C in air for 1 h followed by reduction for various times at 500 °C in a reducing atmosphere. Crystalline films resulted for these conditions. A resistivity of ∼1.01 × 10−3 Ω · cm, at 8 wt. % tin oxide with a transparency of ∼95% at 400 nm, has been achieved for a 273 nm thick film.


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