Hierarchical Micro- and Nanoscale Structures on Surfaces Produced Using a One-Step Pattern Transfer Process

2011 ◽  
Vol 2 (4) ◽  
pp. 289-294 ◽  
Author(s):  
Jie-Ren Li ◽  
Nai-Ning Yin ◽  
Gang-yu Liu
Author(s):  
Nathan J. Jenness ◽  
Kurt D. Wulff ◽  
Matthew S. Johannes ◽  
Daniel G. Cole ◽  
Robert L. Clark

Maskless patterning techniques are increasingly implemented in semiconductor research and manufacturing eliminating the need for costly masks or masters. Recent application of these techniques to DNA and cell patterning demonstrates the adaptability of maskless processes. In this paper we present a new lithographic process for dynamically reconfiguring and arbitrarily positioning computer-generated patterns through the use of phase holograms. Similar to current maskless patterning methods this process can achieve pattern transfer through serially tracing an image onto a substrate. The novelty of our process, however, lies in the ability to rapidly fabricate complex micro/nanoscale structures through single-shot exposure of a substrate.


2019 ◽  
Vol 11 (4) ◽  
pp. 4667-4677 ◽  
Author(s):  
Tzu-Yi Hung ◽  
Jessica An-Chieh Liu ◽  
Wen-Hsiu Lee ◽  
Jie-Ren Li

2020 ◽  
Vol 41 (1) ◽  
pp. 012302 ◽  
Author(s):  
Cheng Jiang ◽  
Xu Wang ◽  
Jian Liu ◽  
Jiqiang Ning ◽  
Changcheng Zheng ◽  
...  

2005 ◽  
Vol 8 (8) ◽  
pp. A382 ◽  
Author(s):  
Kentarou Nishi ◽  
Toyohiko Nishiumi ◽  
Masayoshi Higuchi ◽  
Kimihisa Yamamoto

Author(s):  
B.H. Lee ◽  
G.J. Bae ◽  
K.W. Lee ◽  
G. Cha ◽  
W.D. Kim ◽  
...  

2017 ◽  
Author(s):  
Niyaz Khusnatdinov ◽  
Gary Doyle ◽  
Douglas J. Resnick ◽  
Zhengmao Ye ◽  
Dwayne LaBrake ◽  
...  

2000 ◽  
Vol 39 (Part 1, No. 12B) ◽  
pp. 6781-6785 ◽  
Author(s):  
Yasuhiko Sato ◽  
Eishi Shiobara ◽  
Junko Abe ◽  
Yasunobu Onishi ◽  
Sawako Yoshikawa ◽  
...  

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