Characterization of Pore Structure in a Nanoporous Low-Dielectric-Constant Thin Film by Neutron Porosimetry and X-ray Porosimetry

Langmuir ◽  
2004 ◽  
Vol 20 (16) ◽  
pp. 6658-6667 ◽  
Author(s):  
Ronald C. Hedden ◽  
Hae-Jeong Lee ◽  
Christopher L. Soles ◽  
Barry J. Bauer
Keyword(s):  
Thin Film ◽  
Dielectric Constant ◽  
Pore Structure ◽  
Low Dielectric Constant ◽  
X Ray ◽  
Low Dielectric

The characterization and preparation of porous low dielectric films using various cyclodextrins as template materials

2003 ◽  
Vol 766 ◽  
Author(s):  
Jin-Heong Yim ◽  
Jung-Bae Kim ◽  
Hyun-Dam Jeong ◽  
Yi-Yeoul Lyu ◽  
Sang Kook Mah ◽  
...  
Keyword(s):  
Thin Film ◽  
Mechanical Properties ◽  
Dielectric Constant ◽  
Pore Structure ◽  
Pore Diameter ◽  
Dielectric Films ◽  
Low Dielectric Constant ◽  
Cyclodextrin Derivatives ◽  
Low Dielectric ◽  
Low K

AbstractPorous low dielectric films containing nano pores (∼20Å) with low dielectric constant (<2.2), have been prepared by using various kinds of cyclodextrin derivatives as porogenic materials. The pore structure such as pore size and interconnectivity can be controlled by changing functional groups of the cyclodextrin derivatives. We found that mechanical properties of porous low-k thin film prepared with mCSSQ (modified cyclic silsesquioxane) precursor and cyclodextrin derivatives were correlated with the pore interconnection length. The longer the interconnection length of nanopores in the thin film, the worse the mechanical properties of the thin film (such as hardness and modulus) even though the pore diameter of the films were microporous (∼2nm).

Characterization of low dielectric constant polyaniline thin film synthesized by ac plasma polymerization technique

2002 ◽  
Vol 35 (3) ◽  
pp. 240-245 ◽  
Author(s):  
C Joseph Mathai ◽  
S Saravanan ◽  
M R Anantharaman ◽  
S Venkitachalam ◽  
S Jayalekshmi
Keyword(s):  
Thin Film ◽  
Dielectric Constant ◽  
Plasma Polymerization ◽  
Low Dielectric Constant ◽  
Low Dielectric

Structural characterization of a porous low-dielectric-constant thin film with a non-uniform depth profile

2002 ◽  
Vol 81 (4) ◽  
pp. 607-609 ◽  
Author(s):  
Eric K. Lin ◽  
Hae-Jeong Lee ◽  
Gary W. Lynn ◽  
Wen-li Wu ◽  
Mark L. O’Neill
Keyword(s):  
Thin Film ◽  
Dielectric Constant ◽  
Depth Profile ◽  
Structural Characterization ◽  
Low Dielectric Constant ◽  
Low Dielectric

Deposition and Characterization of Low-Dielectric-Constant SiOC(-H) Thin Films for Interlayer Dielectrics in Multilevel Interconnections

2007 ◽  
Vol 50 (6) ◽  
pp. 1803 ◽  
Author(s):  
Rangaswamy Navamathavan ◽  
An Soo Jung ◽  
Hyun Seung Kim ◽  
Young Jun Jang ◽  
Chi Kyu Choi ◽  
...  
Keyword(s):  
Thin Films ◽  
Dielectric Constant ◽  
Low Dielectric Constant ◽  
Interlayer Dielectrics ◽  
Low Dielectric
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