? Electrical conduction in low dielectric constant SiOC(-H) films with nano-pore structure using dimethyldimethoxysilane /O2 precursors deposited by plasma-enhanced chemical vapor deposition
2010 ◽
Vol 56
(5)
◽
pp. 1478-1483
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2000 ◽
Vol 39
(Part 2, No. 12B)
◽
pp. L1324-L1326
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2006 ◽
Vol 24
(1)
◽
pp. 165-169
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2002 ◽
Vol 149
(8)
◽
pp. F92
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2008 ◽
Vol 53
(1)
◽
pp. 351-356
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2007 ◽
Vol 50
(6)
◽
pp. 1814
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2005 ◽
Vol 44
(7A)
◽
pp. 4886-4890
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