Fabricating Chemical Gradients on Oxide Surfaces by Means of Fluorinated, Catechol-Based, Self-Assembled Monolayers†

Langmuir ◽  
2010 ◽  
Vol 26 (21) ◽  
pp. 16211-16220 ◽  
Author(s):  
Mathias Rodenstein ◽  
Stefan Zürcher ◽  
Samuele G. P. Tosatti ◽  
Nicholas D. Spencer
Langmuir ◽  
2014 ◽  
Vol 30 (39) ◽  
pp. 11591-11598 ◽  
Author(s):  
Giulia Fioravanti ◽  
Francesca Lugli ◽  
Denis Gentili ◽  
Vittoria Mucciante ◽  
Francesca Leonardi ◽  
...  

2014 ◽  
Vol 53 ◽  
pp. 82-89 ◽  
Author(s):  
Pompi Hazarika ◽  
Jonathan M. Behrendt ◽  
Linn Petersson ◽  
Christer Wingren ◽  
Michael L. Turner

2015 ◽  
Vol 51 (11) ◽  
pp. 2060-2063 ◽  
Author(s):  
Austin W. H. Lee ◽  
Brandy K. Pilapil ◽  
Him Wai Ng ◽  
Byron D. Gates

We demonstrate the use of microwave radiation as a tool to accelerate the formation of perfluoroalkylsilane based self-assembled monolayers (SAMs) on silicon oxide surfaces.


Nanoscale ◽  
2011 ◽  
Vol 3 (6) ◽  
pp. 2511 ◽  
Author(s):  
Getachew Tizazu ◽  
Osama El-Zubir ◽  
Steven R. J. Brueck ◽  
David G. Lidzey ◽  
Graham J. Leggett ◽  
...  

2005 ◽  
Vol 154 (1-3) ◽  
pp. 9-12 ◽  
Author(s):  
L. Thomsen ◽  
B. Watts ◽  
D.V. Cotton ◽  
P.C. Dastoor

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