Dynamic Contact Angle Measurement of Temperature-Responsive Surface Properties for Poly(N-isopropylacrylamide) Grafted Surfaces

1994 ◽  
Vol 27 (21) ◽  
pp. 6163-6166 ◽  
Author(s):  
Yoshiyuki G. Takei ◽  
Takashi Aoki ◽  
Kohei Sanui ◽  
Naoya Ogata ◽  
Yasuhisa Sakurai ◽  
...  
Keyword(s):  
Contact Angle ◽  
Surface Properties ◽  
Dynamic Contact Angle ◽  
Dynamic Contact ◽  
Contact Angle Measurement ◽  
Angle Measurement ◽  
Temperature Responsive

Study of the Resistance of SAMs on Aluminium to Acidic and Basic Solutions Using Dynamic Contact Angle Measurement

Langmuir ◽  
2007 ◽  
Vol 23 (3) ◽  
pp. 995-999 ◽  
Author(s):  
Ioannis L. Liakos ◽  
Roger C. Newman ◽  
Eoghan McAlpine ◽  
Morgan R. Alexander
Keyword(s):  
Contact Angle ◽  
Dynamic Contact Angle ◽  
Dynamic Contact ◽  
Contact Angle Measurement ◽  
Angle Measurement ◽  
Basic Solutions

scholarly journals Dynamics on Molecular Films. Surface Characterization of Monolayers by the Wilhelmy-type Dynamic Contact Angle Measurement.

Hyomen Kagaku ◽  
2000 ◽  
Vol 21 (10) ◽  
pp. 643-650
Author(s):  
Koji ABE ◽  
Satomi OHNISHI ◽  
Haruhisa AKIYAMA ◽  
Hiroshi TAKIGUCHI ◽  
Kaoru TAMADA
Keyword(s):  
Contact Angle ◽  
Surface Characterization ◽  
Dynamic Contact Angle ◽  
Dynamic Contact ◽  
Contact Angle Measurement ◽  
Angle Measurement ◽  
Molecular Films

Adsorption of Hyperbranched Polysiloxysilane Modified with Triethoxy Group onto the Silicon Wafer

2007 ◽  
Vol 19 (5-6) ◽  
pp. 700-710 ◽  
Author(s):  
Yasuko Yamada ◽  
Tomoyasu Hirai ◽  
Ryohei Kikuchi ◽  
Teruaki Hayakawa ◽  
Masa-Aki Kakimoto
Keyword(s):  
Contact Angle ◽  
Silicon Wafer ◽  
Photoelectron Spectroscopy ◽  
Dynamic Contact Angle ◽  
Dynamic Contact ◽  
Contact Angle Measurement ◽  
Angle Measurement ◽  
Wafer Surface ◽  
Water Contact ◽  
Silicon Wafer Surface

Triethoxysilyl functionalized hyperbranched polsiloxysilanes at the focal (FT-HBPSs) and terminal (TT-HBPSs) positions were synthesized to investigate adsorption behavior onto a silicon wafer surface. The surface of the silicon wafer adsorbed with the HBPSs was characterized by X-ray photoelectron spectroscopy, atomic force microscopy (AFM), static and dynamic water contact angle measurements. The AFM images indicated the formation size of dot-like structures were approximately 200 nm. The presence of vinyl terminal groups of FT-HBPSs permitted conversion of the surface from a non-polar hydrocarbon to a polar hydroxylated or carboxylated structures. After the polarity was changed, the surface properties were also studied using the above surface analysis techniques. The dynamic contact angle measurement indicated that the silicon wafer surface modified by FT-HBPSs was more hydrophilic in water than TT-HBPS. This behavior can be explained by the difference of connecting points between HBPS and the silicon wafer surface.

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