Directed Self-Assembly of POSS Containing Block Copolymer on Lithographically Defined Chemical Template with Morphology Control by Solvent Vapor

2011 ◽  
Vol 45 (1) ◽  
pp. 292-304 ◽  
Author(s):  
Yasuhiko Tada ◽  
Hiroshi Yoshida ◽  
Yoshihito, Ishida ◽  
Tomoyasu Hirai ◽  
Joan K. Bosworth ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Morphology Control ◽  
Solvent Vapor

Controlled co-solvent vapor annealing and the importance of quenching conditions in thin-film block copolymer self-assembly

2017 ◽  
Vol 55 (15) ◽  
pp. 1125-1130 ◽  
Author(s):  
Brian C. Stahl ◽  
Edward J. Kramer ◽  
Craig J. Hawker ◽  
Nathaniel A. Lynd
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Self Assembly ◽  
Solvent Vapor ◽  
Vapor Annealing ◽  
Solvent Vapor Annealing

Directed Self-Assembly of Thin Block Copolymer Films under Controlled Atmosphere

2006 ◽  
Vol 961 ◽  
Author(s):  
Sangcheol Kim ◽  
R. M. Briber ◽  
Alamgir Karim ◽  
Ronald L. Jones ◽  
Ho-Cheol Kim
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Solubility Parameters ◽  
Controlled Atmosphere ◽  
Solvent Vapor ◽  
Copolymer Films ◽  
Polymer Solubility ◽  
Gradient Technique ◽  
Poly Ethylene Oxide ◽  
Poly Ethylene

ABSTRACTWe have developed a simple and fast methodology to control the orientation of cylindrical microdomains in thin block copolymer films under controlled atmosphere conditions. Asymmetric block copolymers of polystyrene and poly(ethylene oxide) (PS-b-PEO) were dissolved in toluene and spin coated with less than one minute exposure to different solvent vapors and controlled humidity. The specific choice of solvents was based on the polymer solubility parameters and the solvent vapor pressure. By controlling the spin coating environment we were able to produce cylinders with orientations ranging from parallel to perpendicular with respect to the substrate. Orientation was apparently controlled by the preferential affinity of the vapor atmosphere. A combinatorial gradient technique was employed to investigate the mechanism of solvent-induced microdomain orientation.

scholarly journals Reversible Morphology Control in Block Copolymer Films via Solvent Vapor Processing: An in Situ GISAXS Study

2010 ◽  
Vol 43 (9) ◽  
pp. 4253-4260 ◽  
Author(s):  
Marvin Y. Paik ◽  
Joan K. Bosworth ◽  
Detlef-M. Smilges ◽  
Evan L. Schwartz ◽  
Xavier Andre ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Morphology Control ◽  
Solvent Vapor ◽  
Copolymer Films

scholarly journals Optimization and Control of Large Block Copolymer Self-Assembly via Precision Solvent Vapor Annealing

2021 ◽  
Vol 54 (3) ◽  
pp. 1203-1215
Author(s):  
Andrew Selkirk ◽  
Nadezda Prochukhan ◽  
Ross Lundy ◽  
Cian Cummins ◽  
Riley Gatensby ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Large Block ◽  
Solvent Vapor ◽  
Vapor Annealing ◽  
Optimization And Control ◽  
Solvent Vapor Annealing ◽  
And Control

Directed self-assembly of solvent-vapor-induced non-bulk block copolymer morphologies on nanopatterned substrates

Soft Matter ◽  
2016 ◽  
Vol 12 (11) ◽  
pp. 2914-2922 ◽  
Author(s):  
Lei Wan ◽  
Shengxiang Ji ◽  
Chi-Chun Liu ◽  
Gordon S. W. Craig ◽  
Paul F. Nealey
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Self Assembly ◽  
Solvent Vapor ◽  
Chemical Pattern

We demonstrate that annealing a thin film of block copolymer in the vapor of a solvent that is selective to one of the blocks can yield block copolymer domains that do not naturally occur in the bulk, and that these domains can be aligned with and registered to an underlying chemical pattern.

Structural Reorganization in Thin Films of High Molecular Weight Block Copolymer Self-Assembly

2013 ◽  
Vol 853 ◽  
pp. 53-56
Author(s):  
Sung Min Park ◽  
Hyung Ju Ahn ◽  
Sang Woo Kim ◽  
Jin Sam Gong ◽  
Du Yeol Ryu
Keyword(s):  
Thin Films ◽  
Molecular Weight ◽  
Block Copolymer ◽  
High Molecular Weight ◽  
Thermal Annealing ◽  
Self Assembly ◽  
Film Surface ◽  
Structural Reorganization ◽  
Solvent Vapor ◽  
Lamellar Morphology

We demonstrate the structural reorganization of microdomain arrays toward the perpendicular orientation of lamellar morphology in high-molecular-weight PS-b-PMMA films using a combinational approach by solvent-vapor and sequential thermal annealing processes. Solvent annealing with a PMMA-selective acetone vapor induced a cylindrical morphology. However, the sequential thermal annealing of block copolymer (BCP) films led to structural reorganization to an equilibrium lamellar morphology, where the lamellar microdomains were oriented to normal to the film surface. This technique suggests an efficient route for directing orientation and structural reorganization of microdomain arrays in the thin films of high-molecular-weight BCP self-assembly.

The Self-Assembly of an Amphiphilic Block Copolymer: A Dissipative Particle Dynamics Study

2005 ◽  
Vol 42 (3) ◽  
pp. 180-183 ◽  
Author(s):  
S. G. Schulz ◽  
U. Frieske ◽  
H. Kuhn ◽  
G. Schmid ◽  
F. Müller ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Dissipative Particle Dynamics ◽  
Particle Dynamics ◽  
The Self ◽  
Amphiphilic Block Copolymer

Nanoscratch-Directed Self-Assembly of Block Copolymer Thin Films

2021 ◽  
Vol 13 (4) ◽  
pp. 5772-5781
Author(s):  
Dong Hyup Kim ◽  
Ahram Suh ◽  
Geonhyeong Park ◽  
Dong Ki Yoon ◽  
So Youn Kim
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Self Assembly

Oxidation and ATP dual-responsive block copolymer containing tertiary sulfoniums: self-assembly, protein complexation and triggered release

2021 ◽  
Author(s):  
Yanfen Jiang ◽  
Shuqi Dong ◽  
Guoyang Qin ◽  
Li Liu ◽  
Hanying Zhao
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Phenylboronic Acid ◽  
Cationic Polymer ◽  
Release Profile ◽  
Triggered Release ◽  
Dual Responsive ◽  
Protein Complexation

Alkylation of thioether-containing block copolymer simultaneously incorporated sulfoniums and phenylboronic acid moieties. The co-assembly of this cationic polymer and protein generated micelles with an H2O2-and ATP-responsive release profile.

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