Structural Reorganization in Thin Films of High Molecular Weight Block Copolymer Self-Assembly

2013 ◽  
Vol 853 ◽  
pp. 53-56
Author(s):  
Sung Min Park ◽  
Hyung Ju Ahn ◽  
Sang Woo Kim ◽  
Jin Sam Gong ◽  
Du Yeol Ryu
Keyword(s):  
Thin Films ◽  
Molecular Weight ◽  
Block Copolymer ◽  
High Molecular Weight ◽  
Thermal Annealing ◽  
Self Assembly ◽  
Film Surface ◽  
Structural Reorganization ◽  
Solvent Vapor ◽  
Lamellar Morphology

We demonstrate the structural reorganization of microdomain arrays toward the perpendicular orientation of lamellar morphology in high-molecular-weight PS-b-PMMA films using a combinational approach by solvent-vapor and sequential thermal annealing processes. Solvent annealing with a PMMA-selective acetone vapor induced a cylindrical morphology. However, the sequential thermal annealing of block copolymer (BCP) films led to structural reorganization to an equilibrium lamellar morphology, where the lamellar microdomains were oriented to normal to the film surface. This technique suggests an efficient route for directing orientation and structural reorganization of microdomain arrays in the thin films of high-molecular-weight BCP self-assembly.

scholarly journals Temperature-Controlled Solvent Vapor Annealing of Thin Block Copolymer Films

Polymers ◽  
2019 ◽  
Vol 11 (8) ◽  
pp. 1312 ◽  
Author(s):  
Xiao Cheng ◽  
Alexander Böker ◽  
Larisa Tsarkova
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Thermal Annealing ◽  
Saturated Vapor ◽  
Polymer Chains ◽  
Special Focus ◽  
Solvent Vapor ◽  
Copolymer Films ◽  
Vapor Annealing ◽  
Solvent Vapor Annealing

Solvent vapor annealing is as an effective and versatile alternative to thermal annealing to equilibrate and control the assembly of polymer chains in thin films. Here, we present scientific and practical aspects of the solvent vapor annealing method, including the discussion of such factors as non-equilibrium conformational states and chain dynamics in thin films in the presence of solvent. Homopolymer and block copolymer films have been used in model studies to evaluate the robustness and the reproducibility of the solvent vapor processing, as well as to assess polymer-solvent interactions under confinement. Advantages of utilizing a well-controlled solvent vapor environment, including practically interesting regimes of weakly saturated vapor leading to poorly swollen states, are discussed. Special focus is given to dual temperature control over the set-up instrumentation and to the potential of solvo-thermal annealing. The evaluated insights into annealing dynamics derived from the studies on block copolymer films can be applied to improve the processing of thin films of crystalline and conjugated polymers as well as polymer composite in confined geometries.

Expanding the morphology library of block copolymer self-assemblies with clews of tubules

2017 ◽  
Vol 53 (36) ◽  
pp. 5005-5008 ◽  
Author(s):  
Xiao-Li Sun ◽  
Dong-Ming Liu ◽  
Pan Wang ◽  
Jia-Lin Tan ◽  
Kang-Kang Li ◽  
...  
Keyword(s):  
Molecular Weight ◽  
Block Copolymer ◽  
High Molecular Weight ◽  
Self Assembly ◽  
High Asymmetry ◽  
Very High

Clews of tubules are reported via block copolymer self-assembly of P4VP-b-PS with both high asymmetry and very high molecular weight.

scholarly journals Giant Gyroid and Templates from High-Molecular-Weight Block Copolymer Self-assembly

2016 ◽  
Vol 6 (1) ◽  
Author(s):  
Sungmin Park ◽  
Yeongsik Kim ◽  
Hyungju Ahn ◽  
Jong Hak Kim ◽  
Pil J. Yoo ◽  
...  
Keyword(s):  
Molecular Weight ◽  
Block Copolymer ◽  
High Molecular Weight ◽  
Self Assembly

Self-assembly of an ultra-high-molecular-weight comb block copolymer at the air–water interface

Soft Matter ◽  
2009 ◽  
Vol 5 (23) ◽  
pp. 4698 ◽  
Author(s):  
Lei Zhao ◽  
Matthew D. Goodman ◽  
Ned B. Bowden ◽  
Zhiqun Lin
Keyword(s):  
Molecular Weight ◽  
Block Copolymer ◽  
High Molecular Weight ◽  
Self Assembly ◽  
Water Interface ◽  
Air Water Interface ◽  
Ultra High Molecular Weight

Substrate-Independent Lamellar Orientation in High-Molecular-Weight Polystyrene-b-poly(methyl methacrylate) Films: Neutral Solvent Vapor and Thermal Annealing Effect

2014 ◽  
Vol 47 (12) ◽  
pp. 3969-3977 ◽  
Author(s):  
Eunyoung Choi ◽  
Sungmin Park ◽  
Hyungju Ahn ◽  
Moongyu Lee ◽  
Joona Bang ◽  
...  
Keyword(s):  
Molecular Weight ◽  
Methyl Methacrylate ◽  
High Molecular Weight ◽  
Thermal Annealing ◽  
Annealing Effect ◽  
Solvent Vapor ◽  
Poly Methyl Methacrylate ◽  
Lamellar Orientation ◽  
Substrate Independent ◽  
Neutral Solvent

Rapid structural reorganization in thin films of block copolymer self-assembly

Soft Matter ◽  
2012 ◽  
Vol 8 (13) ◽  
pp. 3570 ◽  
Author(s):  
Jinsam Gong ◽  
Hyungju Ahn ◽  
Eunhye Kim ◽  
Hoyeon Lee ◽  
Sungmin Park ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Self Assembly ◽  
Structural Reorganization

scholarly journals Self-Assembly in ultrahigh molecular weight sphere-forming diblock copolymer thin films under strong confinement

2019 ◽  
Vol 9 (1) ◽  
Author(s):  
Wei Cao ◽  
Senlin Xia ◽  
Michael Appold ◽  
Nitin Saxena ◽  
Lorenz Bießmann ◽  
...  
Keyword(s):  
Thin Films ◽  
Molecular Weight ◽  
Film Thickness ◽  
Self Assembly ◽  
Diblock Copolymers ◽  
Grazing Incidence ◽  
Structure Evolution ◽  
Solvent Vapor ◽  
Chain Mobility ◽  
Ultrahigh Molecular Weight

AbstractUltrahigh molecular weight (UHMW) diblock copolymers (DBCs) have emerged as a promising template for fabricating large-sized nanostructures. Therefore, it is of high significance to systematically study the influence of film thickness and solvent vapor annealing (SVA) on the structure evolution of UHMW DBC thin films. In this work, spin coating of an asymmetric linear UHMW polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) DBC is used to fabricate thin films, which are spherically structured with an inter-domain distance larger than 150 nm. To enhance the polymer chain mobility and facilitate approaching equilibrium nanostructures, SVA is utilized as a post-treatment of the spin coated films. With increasing film thickness, a local hexagonal packing of PMMA half-spheres on the surface can be obtained, and the order is improved at larger thickness, as determined by grazing incidence small angle X-ray scattering (GISAXS). Additionally, the films with locally hexagonal packed half-spherical morphology show a poor order-order-poor order transition upon SVA, indicating the realization of ordered structure using suitable SVA parameters.

Tailoring Microdomain Orientation in Block Copolymer Thin Films for Lithographic Application

2006 ◽  
Vol 961 ◽  
Author(s):  
Hiroshi Yoshida ◽  
Hirofumi Kitano ◽  
Satoshi Akasaka ◽  
Tomohiro Inoue ◽  
Mikihito Taknaka ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Methyl Methacrylate ◽  
Self Assembly ◽  
Diblock Copolymers ◽  
Simple Technique ◽  
Film Surface ◽  
Magnetic Media ◽  
Regular Array ◽  
Block Copolymer Lithography

ABSTRACTBlock copolymer lithography is a promising method for fabricating periodical nano patterns less than 20nm by self-assembly and can be applicable for fabricating patterned magnetic media with recording density over 1Tbit/inch2. We found a simple technique to control the orientation of cylindrical microdomains in thin films. Only by mixing polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymers with the constituent homopolymer (PS or PMMA), we could align the cylindrical microdomains perpendicular to the film surface. The added homopolymer induces conformational entropic relaxation of the block chains in microdomain space and stabilizes perpendicular orientation of hexagonally packed cylindrical microdomains. Thus formed perpendicular cylinders can be readily aligned in a regular array with a grating substrate.

Morphology, directed self-assembly and pattern transfer from a high molecular weight polystyrene-block-poly(dimethylsiloxane) block copolymer film

2017 ◽  
Vol 28 (14) ◽  
pp. 145301 ◽  
Author(s):  
Li-Chen Cheng ◽  
Wubin Bai ◽  
Eduardo Fernandez Martin ◽  
Kun-Hua Tu ◽  
Konstantinos Ntetsikas ◽  
...  
Keyword(s):  
Molecular Weight ◽  
Block Copolymer ◽  
High Molecular Weight ◽  
Self Assembly ◽  
Copolymer Film ◽  
Pattern Transfer
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