scholarly journals Strong texture tuning along different crystalline directions in glass-supported CeO2 thin films by ultrasonic spray pyrolysis

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Inti Zumeta-Dubé ◽  
José Manuel García Rangel ◽  
Jorge Roque ◽  
Issis Claudette Romero-Ibarra ◽  
Mario Fidel García Sánchez

AbstractThe strong facet-dependent performance of glass-supported CeO2 thin films in different applications (catalysis, smart windows, etc.) has been the target of diverse fundamental and technological approaches. However, the design of accurate, cost-effective and scalable methods with the potential for large-area coverage that produce highly textured glass-supported CeO2 thin films remains a technological challenge. In the present work, it is demonstrated that under proper tuning conditions, the ultrasonic spray pyrolysis technique enables one to obtain glass-supported polycrystalline CeO2 films with noticeable texture along both the (100) and (111) directions, as well as with randomly oriented crystallites (no texture). The influence of flow rates, solution molarity, and substrate temperature on the texture and morphological characteristics, as well as optical absorption and Raman response of the deposited films, is evaluated. The obtained results are discussed on the basis of the combined dependence of the CeO2-exposed surfaces on the thermodynamic stability of the corresponding facets and the reaction kinetics, which modulate the crystallite growth direction.

2010 ◽  
Vol 644 ◽  
pp. 105-108 ◽  
Author(s):  
M.A. García-Lobato ◽  
A. Hernández-V ◽  
H.M. Hdz-García ◽  
Arturo I. Martinez ◽  
M.I. Pech-Canul

Fe2O3 thin films were obtained on glass substrates by the ultrasonic spray pyrolysis technique; additionally, a thermodynamic analysis on the Fe2O3 formation from different precursor salts was performed. In this work, the influence of the deposition temperature is related with the structural, optical, and morphological properties of the iron oxide films. The present results reveal that amorphous thin films are obtained at temperatures lower than 350° C, while polycrystalline films with the maghemite structure are formed at higher temperatures.


2021 ◽  
Vol 67 (5 Sep-Oct) ◽  
Author(s):  
Roberto Vazquez-Arreguin ◽  
Alejandro Gonzalez Cisneros ◽  
Antonio Gustavo Juárez-Gracia ◽  
Luis Mariscal-Becerra ◽  
Miguel García-Rocha ◽  
...  

HfO2 thin films are proposed as high-k gate dielectric, especially for the fabrication of ultra-large-scale integration systems. The effect of adding deionized water during the synthesis of HfO2 thin films on its structural and dielectric properties is reported. The study of nanostructured HfO2 thin films deposited on crystalline silicon wafers is made by applying the ultrasonic spray pyrolysis (USP) technique. For the synthesis of hafnium oxide thin films, hafnium acetylacetonate was dissolved in dimethylformamide as a hafnium source material. Varying the substrate temperature from 400 and up to 550 °C in increments of 50 °C and adding deionized water during the process, favoring films with well-defined monoclinic well as polycrystalline structures. The thin films presented a nanostructured morphology and a rugosity with a minimum value of 0.45 nm. Refractive index values between 1.87 and 2.02 have been obtained with an average thickness of ~ 21 nm. The carbon and O-H binds decrease considerably, adding deionized water to the deposit. The electrical characterization revealed that the films deposited with deionized water have a high dielectric constant with a maximum value of 14.4, demonstrating that this addition during deposition allows thinner films with good dielectric properties.


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