Non-disruptive techniques for depth profiling in photoemission spectroscopy

Author(s):  
Iolanda Di Bernardo
2008 ◽  
Vol 92 (8) ◽  
pp. 082903 ◽  
Author(s):  
T. Tanimura ◽  
S. Toyoda ◽  
H. Kumigashira ◽  
M. Oshima ◽  
K. Ikeda ◽  
...  

2018 ◽  
Vol 115 (31) ◽  
pp. 7896-7900 ◽  
Author(s):  
Kazuhiro Namba ◽  
Shohei Ogura ◽  
Satoshi Ohno ◽  
Wen Di ◽  
Koichi Kato ◽  
...  

Enhancement of hydrogen (H) absorption kinetics improves the performance of hydrogen-purifying membranes and hydrogen-storage materials, which is necessary for utilizing hydrogen as a carbon-free energy carrier. Pd–Au alloys are known to show higher hydrogen solubility than pure Pd. However, the effect of Au on the hydrogen penetration from the surface into the subsurface region has not been clarified so far. Here, we investigate the hydrogen absorption at Pd–Au surface alloys on Pd(110) by means of thermal desorption spectroscopy (TDS) and hydrogen depth profiling with nuclear reaction analysis (NRA). We demonstrate that alloying the Pd(110) surface with submonolayer amounts of Au dramatically accelerates the hydrogen absorption. The degree of acceleration shows a volcano-shaped form against Au coverage. This kinetic enhancement is explained by a reduced penetration barrier mainly caused by a destabilization of chemisorbed surface hydrogen, which is supported by density-functional-theory (DFT) calculations. The destabilization of chemisorbed surface hydrogen is attributed to the change of the surface electronic states as observed by angle-resolved photoemission spectroscopy (ARPES). If generalized, these discoveries may lead to improving and controlling the hydrogen transport across the surfaces of hydrogen-absorbing materials.


2002 ◽  
Vol 725 ◽  
Author(s):  
X. D. Feng ◽  
D. Grozea ◽  
A. Turak ◽  
Z. H. Lu ◽  
H. Aziz ◽  
...  

AbstractThe organic/cathode interface plays an important role in device degradation of organic light-emitting diodes (OLEDs). The interface between 8-hydroxyquinolino aluminium (Alq) and Mg:Ag cathode in OLEDs, operated for some time, was characterized using Xray photoemission spectroscopy (XPS). An in-vacuum peel-off method was used to separate the buried interfaces. XPS results indicate that Alq molecules break down, resulting in formation of fragmented hydroxyquinolino, Mg oxides, and metallic Al at the interface. It is also found by XPS depth-profiling measurement that metallic Al diffuses into the cathode electrode, and that the fraction of oxidized Mg decreases gradually from the interface but extended very deep into the cathode.


2012 ◽  
Vol 85 (16) ◽  
Author(s):  
M. Minohara ◽  
K. Horiba ◽  
H. Kumigashira ◽  
E. Ikenaga ◽  
M. Oshima

Author(s):  
M.P. Thomas ◽  
A.R. Waugh ◽  
M.J. Southon ◽  
Brian Ralph

It is well known that ion-induced sputtering from numerous multicomponent targets results in marked changes in surface composition (1). Preferential removal of one component results in surface enrichment in the less easily removed species. In this investigation, a time-of-flight atom-probe field-ion microscope A.P. together with X-ray photoelectron spectroscopy XPS have been used to monitor alterations in surface composition of Ni3Al single crystals under argon ion bombardment. The A.P. has been chosen for this investigation because of its ability using field evaporation to depth profile through a sputtered surface without the need for further ion sputtering. Incident ion energy and ion dose have been selected to reflect conditions widely used in surface analytical techniques for cleaning and depth-profiling of samples, typically 3keV and 1018 - 1020 ion m-2.


Author(s):  
Mark Denker ◽  
Jennifer Wall ◽  
Mark Ray ◽  
Richard Linton

Reactive ion beams such as O2+ and Cs+ are used in Secondary Ion Mass Spectrometry (SIMS) to analyze solids for trace impurities. Primary beam properties such as energy, dose, and incidence angle can be systematically varied to optimize depth resolution versus sensitivity tradeoffs for a given SIMS depth profiling application. However, it is generally observed that the sputtering process causes surface roughening, typically represented by nanometer-sized features such as cones, pits, pyramids, and ripples. A roughened surface will degrade the depth resolution of the SIMS data. The purpose of this study is to examine the relationship of the roughness of the surface to the primary ion beam energy, dose, and incidence angle. AFM offers the ability to quantitatively probe this surface roughness. For the initial investigations, the sample chosen was <100> silicon, and the ion beam was O2+.Work to date by other researchers typically employed Scanning Tunneling Microscopy (STM) to probe the surface topography.


2018 ◽  
Vol 2 (1) ◽  
pp. 7
Author(s):  
S Chirino ◽  
Jaime Diaz ◽  
N Monteblanco ◽  
E Valderrama

The synthesis and characterization of Ti and TiN thin films of different thicknesses was carried out on a martensitic stainless steel AISI 410 substrate used for tool manufacturing. The mechanical parameters between the interacting surfaces such as thickness, adhesion and hardness were measured. By means of the scanning electron microscope (SEM) the superficial morphology of the Ti/TiN interface was observed, finding that the growth was of columnar grains and by means of EDAX the existence of titanium was verified.  Using X-ray diffraction (XRD) it was possible to observe the presence of residual stresses (~ -3.1 GPa) due to the different crystalline phases in the coating. Under X-ray photoemission spectroscopy (XPS) it was possible to observe the molecular chemical composition of the coating surface, being Ti-N, Ti-N-O and Ti-O the predominant ones.


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