Synthesis of TiN thin films from titanium imido complexes

2002 ◽  
Vol 13 (1) ◽  
pp. 84-87 ◽  
Author(s):  
Claire J. Carmalt ◽  
Anne Newport ◽  
Ivan P. Parkin ◽  
Philip Mountford ◽  
Andrew J. Sealey ◽  
...  
2021 ◽  
pp. 109844
Author(s):  
Zaoli Zhang ◽  
Arsham Ghasemi ◽  
Nikola Koutná ◽  
Zhen Xu ◽  
Thomas Grünstäudl ◽  
...  

2011 ◽  
Vol 306-307 ◽  
pp. 274-279
Author(s):  
Qing Tao ◽  
Yan Wei Sui ◽  
Sun Zhi ◽  
Wei Song

AlN and TiN thin films are widely used in electronic devices and acoustic material and other fields because of its unique merit, the preparation of nitride thin films by using the arc ion plating has not been a systematic and deep study. The article presents our research procedure which the AlN and TiN thin films are deposited on stainless steel substrate by arc ion plating (AIP). The characteristics of thin films, for example microstructure, morphology, composition analysis and hardness, are examined and analyzed. The results showed that: Droplet-like particles appear in the microstructure of nitride thin films, and the grain size of droplet-like particles in AlN thin films is greater than in TiN thin films. The micro-hardness of nitride films preparation in experiment has improved significantly, and establish firmly basic for extending the application field of nitride film.


2021 ◽  
Vol 291 ◽  
pp. 129554
Author(s):  
Hyunchol Cho ◽  
Ben Nie ◽  
Ajit Dhamdhere ◽  
Yifei Meng ◽  
Monica Neuburger ◽  
...  

2008 ◽  
pp. 5730 ◽  
Author(s):  
Stephen E. Potts ◽  
Claire J. Carmalt ◽  
Christopher S. Blackman ◽  
Thomas Leese ◽  
Hywel O. Davies

1981 ◽  
Vol 52 (11) ◽  
pp. 6659-6664 ◽  
Author(s):  
M. Wittmer ◽  
J. Noser ◽  
H. Melchior

1997 ◽  
Vol 25 (4) ◽  
pp. 675-679 ◽  
Author(s):  
P.J. Martin ◽  
A. Bendavid ◽  
T.J. Kinder

1999 ◽  
Vol 30 (7) ◽  
pp. 657-665 ◽  
Author(s):  
T.A. Rawdanowicz ◽  
V. Godbole ◽  
J. Narayan ◽  
J. Sankar ◽  
A. Sharma

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