Deposition of thin films of organic–inorganic hybrid materials based on aromatic carboxylic acids by atomic layer deposition

2010 ◽  
Vol 39 (48) ◽  
pp. 11628 ◽  
Author(s):  
Karina Barnholt Klepper ◽  
Ola Nilsen ◽  
Helmer Fjellvåg
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Carboxylic Acids ◽  
Hybrid Materials ◽  
Atomic Layer ◽  
Inorganic Hybrid ◽  
Aromatic Carboxylic Acids ◽  
Layer Deposition

Atomic Layer Deposition of Organic-Inorganic Hybrid Materials Based on Unsaturated Linear Carboxylic Acids

2011 ◽  
Vol 2011 (34) ◽  
pp. 5305-5312 ◽  
Author(s):  
Karina B. Klepper ◽  
Ola Nilsen ◽  
Thomas Levy ◽  
Helmer Fjellvåg
Keyword(s):  
Atomic Layer Deposition ◽  
Carboxylic Acids ◽  
Hybrid Materials ◽  
Atomic Layer ◽  
Inorganic Hybrid ◽  
Layer Deposition

scholarly journals Guidance of growth mode and structural character in organic–inorganic hybrid materials – a comparative study

2014 ◽  
Vol 43 (9) ◽  
pp. 3492-3500 ◽  
Author(s):  
K. B. Klepper ◽  
O. Nilsen ◽  
S. Francis ◽  
H. Fjellvåg
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Comparative Study ◽  
Hybrid Materials ◽  
Atomic Layer ◽  
Organic Ligands ◽  
Film Properties ◽  
Inorganic Hybrid ◽  
Layer Deposition ◽  
Hybrid Thin Films

We investigated the influence of the functionality of organic ligands on film properties in organic–inorganic hybrid thin films deposited by atomic layer deposition.

Atomic layer deposition of organic–inorganic hybrid materials based on saturated linear carboxylic acids

2011 ◽  
Vol 40 (17) ◽  
pp. 4636 ◽  
Author(s):  
Karina Barnholt Klepper ◽  
Ola Nilsen ◽  
Per-Anders Hansen ◽  
Helmer Fjellvåg
Keyword(s):  
Atomic Layer Deposition ◽  
Carboxylic Acids ◽  
Hybrid Materials ◽  
Atomic Layer ◽  
Inorganic Hybrid ◽  
Layer Deposition

Deposition of Organic- Inorganic Hybrid Materials by Atomic Layer Deposition

2019 ◽  
Vol 16 (4) ◽  
pp. 3-14 ◽  
Author(s):  
Ola Nilsen ◽  
Karina Klepper ◽  
Heidi Nielsen ◽  
Helmer Fjellvaåg
Keyword(s):  
Atomic Layer Deposition ◽  
Hybrid Materials ◽  
Atomic Layer ◽  
Inorganic Hybrid ◽  
Layer Deposition

A chemisorbed interfacial layer for seeding atomic layer deposition on graphite

Nanoscale ◽  
2021 ◽  
Author(s):  
Anton Brown ◽  
John Greenwood ◽  
César Lockhart de la Rosa ◽  
Miriam Candelaria Rodriguez Gonzalez ◽  
Ken Verguts ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Hybrid Materials ◽  
Interfacial Layer ◽  
Atomic Layer ◽  
Two Dimensional ◽  
Layer Deposition ◽  
Two Dimensional Materials ◽  
Inert Surface

The integration of graphene, and more broadly two-dimensional materials, into devices and hybrid materials often requires the deposition of thin films on their usually inert surface. As a result, strategies...

Organic–inorganic hybrid semiconductor thin films deposited using molecular-atomic layer deposition (MALD)

2016 ◽  
Vol 4 (12) ◽  
pp. 2382-2389 ◽  
Author(s):  
Jie Huang ◽  
Hengji Zhang ◽  
Antonio Lucero ◽  
Lanxia Cheng ◽  
Santosh KC ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Deposition Temperature ◽  
Atomic Layer ◽  
Inorganic Hybrid ◽  
Diethyl Zinc ◽  
Layer Deposition ◽  
Semiconductor Thin Films ◽  
Sharp Interfaces ◽  
Low Deposition Temperature

Molecular-atomic layer deposition (MALD) is employed to fabricate hydroquinone (HQ)/diethyl zinc (DEZ) organic–inorganic hybrid semiconductor thin films with accurate thickness control, sharp interfaces, and low deposition temperature.

Carboxylic Acids as Oxygen Supplying Agents for Atomic Layer Deposition of High-k Thin Films

2019 ◽  
Vol 16 (4) ◽  
pp. 279-289
Author(s):  
Erwan Rauwel ◽  
Frédérique Ducroquet ◽  
Protima Rauwel ◽  
Marc-Georg Willinger ◽  
Igor Matko ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Carboxylic Acids ◽  
Atomic Layer ◽  
Layer Deposition ◽  
High K
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