A novel method for photolithographic polymer shadow masking: toward high-resolution high-performance top-contact organic field effect transistors
Keyword(s):
The present work shows a novel method to prepare polymer-based masks called photolithographic polymer shadow masking and its application in the process of fabricating top-contact high-resolution OFETs.
2013 ◽
Vol 14
(9)
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pp. 2249-2256
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2017 ◽
Vol 3
(10)
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pp. 1700142
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2017 ◽
Vol 9
(37)
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pp. 32411-32411
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