Graphene film growth on sputtered thin Cu–Ni alloy film by inductively coupled plasma chemical vapor deposition

Film Growth ◽

Graphene Film ◽

Chemical Vapor ◽

Alloy Film ◽

Alloy Thin Film ◽

Plasma Chemical ◽

Inductively Coupled ◽

Ni Alloy

Graphene film growth on a Cu–Ni alloy thin film with various alloy compositions is reported in this paper.

Hydrogenated Microcrystalline Silicon Film Growth by Inductively Coupled Plasma–Chemical Vapor Deposition on ZrO2Gate Dielectric for Thin Film Transistors

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.4365 ◽

2006 ◽

Vol 45 (5B) ◽

pp. 4365-4369 ◽

Cited By ~ 6

Author(s):

Chang-Wook Han ◽

Joong-Hyun Park ◽

Sang-Myeon Han ◽

Min-Koo Han ◽

Ki-Yong Kim ◽

...

Keyword(s):

Vapor Deposition ◽

Film Growth ◽

Silicon Film ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Plasma Chemical ◽

Inductively Coupled ◽

Microcrystalline Silicon Film

High voltage AlGaN/GaN Schottky barrier diode employing the inductively coupled plasma-chemical vapor deposition SiO2 passivation

2007 7th Internatonal Conference on Power Electronics ◽

10.1109/icpe.2007.4692351 ◽

2007 ◽

Author(s):

Young-Hwan Choi ◽

Jiyong Lim ◽

Kyu-Heon Cho ◽

Min-Koo Han

Keyword(s):

Schottky Barrier ◽

High Voltage ◽

Vapor Deposition ◽

Chemical Vapor ◽

Schottky Barrier Diode ◽

Plasma Chemical ◽

Low Temperature Silicon Nitride and Silicon Dioxide Film Processing by Inductively Coupled Plasma Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1393382 ◽

2000 ◽

Vol 147 (4) ◽

pp. 1481 ◽

Cited By ~ 39

Author(s):

J. W. Lee ◽

K. D. Mackenzie ◽

D. Johnson ◽

J. N. Sasserath ◽

S. J. Pearton ◽

...

Keyword(s):

Silicon Nitride ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Silicon Dioxide Film ◽

Inductively Coupled ◽

Dioxide Film

Electron Field Emission from a-C:F:N Film Deposited by Inductively Coupled Plasma Chemical Vapor Deposition

SID Symposium Digest of Technical Papers ◽

10.1889/1.1833829 ◽

1998 ◽

Vol 29 (1) ◽

pp. 601

Author(s):

Suk Jae Chung ◽

Eun Jung Han ◽

Jong Hyun Moon ◽

Myung Hwan Oh ◽

Jin Jang

Keyword(s):

Field Emission ◽

Vapor Deposition ◽

Chemical Vapor ◽

Electron Field Emission ◽

Plasma Chemical ◽

Inductively Coupled ◽

Electron Field

Organo-Functionalization of Silicon Nanocrystals Synthesized by Inductively Coupled Plasma Chemical Vapor Deposition

Bulletin of the Korean Chemical Society ◽

10.1002/bkcs.10758 ◽

2016 ◽

Vol 37 (5) ◽

pp. 705-712

Author(s):

Don-Sung Lee ◽

Dong-Hoe Choe ◽

Seung-Wan Yoo ◽

Jung-Hyung Kim ◽

Hyun-Dam Jeong

Keyword(s):

Vapor Deposition ◽

Silicon Nanocrystals ◽

Chemical Vapor ◽

Plasma Chemical ◽

Exploring High Refractive Index Silicon-Rich Nitride Films by Low-Temperature Inductively Coupled Plasma Chemical Vapor Deposition and Applications for Integrated Waveguides

ACS Applied Materials & Interfaces ◽

10.1021/acsami.5b06329 ◽

2015 ◽

Vol 7 (39) ◽

pp. 21884-21889 ◽

Cited By ~ 45

Author(s):

Doris K. T. Ng ◽

Qian Wang ◽

Ting Wang ◽

Siu-Kit Ng ◽

Yeow-Teck Toh ◽

...

Keyword(s):

Refractive Index ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Refractive Index ◽

Plasma Chemical ◽

Non-catalytic direct synthesis of graphene on Si (111) wafers by using inductively-coupled plasma chemical vapor deposition

Journal of the Korean Physical Society ◽

10.3938/jkps.69.536 ◽

2016 ◽

Vol 69 (4) ◽

pp. 536-540

Author(s):

Sung Won Hwang ◽

Hyunho Shin ◽

Bongsoo Lee ◽

Suk-Ho Choi

Keyword(s):

Vapor Deposition ◽

Direct Synthesis ◽

Chemical Vapor ◽

Plasma Chemical ◽

Enhanced Nucleation of Microcrystalline Silicon Thin Films Deposited by Inductively Coupled Plasma Chemical Vapor Deposition with Low-Frequency Pulse Substrate Bias

Japanese Journal of Applied Physics ◽

10.1143/jjap.49.050202 ◽

2010 ◽

Vol 49 (5) ◽

pp. 050202

Author(s):

Mamoru Furuta ◽

Takahiro Hiramatsu ◽

Takashi Hirao

Keyword(s):

Low Frequency ◽

Chemical Vapor ◽

Substrate Bias ◽

Microcrystalline Silicon ◽

Plasma Chemical ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Frequency Pulse

High-density inductively coupled plasma chemical vapor deposition of silicon nitride for solar cell application

Solar Energy Materials and Solar Cells ◽

10.1016/s0927-0248(02)00053-3 ◽

2002 ◽

Vol 74 (1-4) ◽

pp. 97-105 ◽

Cited By ~ 22

Author(s):

I.O Parm ◽

K Kim ◽

D.G Lim ◽

J.H Lee ◽

J.H Heo ◽

...

Keyword(s):

Solar Cell ◽

Silicon Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Solar Cell Application ◽

Effects of substrate temperature on structural, optical and morphological properties of hydrogenated nanocrystalline silicon thin films prepared by inductively coupled plasma chemical vapor deposition

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-015-3426-0 ◽

2015 ◽

Vol 26 (10) ◽

pp. 7790-7796 ◽

Cited By ~ 2

Author(s):

Dingyu Yang ◽

Xinghua Zhu ◽

Hui Sun ◽

Xiuying Gao ◽

Xu Li

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Morphological Properties ◽

Plasma Chemical ◽

Inductively Coupled ◽

Silicon Thin Films