Hydrogenated Microcrystalline Silicon Film Growth by Inductively Coupled Plasma–Chemical Vapor Deposition on ZrO2Gate Dielectric for Thin Film Transistors

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.4365 ◽

2006 ◽

Vol 45 (5B) ◽

pp. 4365-4369 ◽

Author(s):

Chang-Wook Han ◽

Joong-Hyun Park ◽

Sang-Myeon Han ◽

Min-Koo Han ◽

Ki-Yong Kim ◽

...

Keyword(s):

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Film Growth ◽

Silicon Film ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Microcrystalline Silicon Film

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Growth of microcrystalline silicon film by electron beam excited plasma chemical vapor deposition without hydrogen dilution

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581471 ◽

1998 ◽

Vol 16 (5) ◽

pp. 3134-3137 ◽

Author(s):

Mitsuru Imaizumi ◽

Kazuhiko Okitsu ◽

Masafumi Yamaguchi ◽

Tamio Hara ◽

Tadashi Ito ◽

...

Keyword(s):

Electron Beam ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Silicon Film ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogen Dilution ◽

Microcrystalline Silicon Film

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Preparation of Phosphorus Doped Hydrogenated Microcrystalline Silicon Thin Films by Inductively Coupled Plasma Chemical Vapor Deposition and Their Characteristics for Solar Cell Applications

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2008.1265 ◽

2008 ◽

Vol 8 (10) ◽

pp. 5521-5526 ◽

Author(s):

Chaehwan Jeong ◽

Seongjae Boo ◽

Tae-Won Kim ◽

Bum-Ho Choi ◽

Ho-Sung Kim ◽

...

Keyword(s):

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Phosphorus Doped

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High rate deposition of microcrystalline silicon films using jet-type inductively coupled plasma chemical vapor deposition

Vacuum ◽

10.1016/j.vacuum.2011.04.031 ◽

2012 ◽

Vol 86 (7) ◽

pp. 924-928 ◽

Author(s):

Zewen Zuo ◽

Yu Wang ◽

Jin Lu ◽

Junzhuan Wang ◽

Lin Pu ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Silicon Films ◽

High Rate ◽

Microcrystalline Silicon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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High voltage AlGaN/GaN Schottky barrier diode employing the inductively coupled plasma-chemical vapor deposition SiO2 passivation

2007 7th Internatonal Conference on Power Electronics ◽

10.1109/icpe.2007.4692351 ◽

2007 ◽

Author(s):

Young-Hwan Choi ◽

Jiyong Lim ◽

Kyu-Heon Cho ◽

Min-Koo Han

Keyword(s):

Chemical Vapor Deposition ◽

Schottky Barrier ◽

High Voltage ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Schottky Barrier Diode ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Low Temperature Silicon Nitride and Silicon Dioxide Film Processing by Inductively Coupled Plasma Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1393382 ◽

2000 ◽

Vol 147 (4) ◽

pp. 1481 ◽

Author(s):

J. W. Lee ◽

K. D. Mackenzie ◽

D. Johnson ◽

J. N. Sasserath ◽

S. J. Pearton ◽

...

Keyword(s):

Silicon Nitride ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Silicon Dioxide Film ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

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Electron Field Emission from a-C:F:N Film Deposited by Inductively Coupled Plasma Chemical Vapor Deposition

SID Symposium Digest of Technical Papers ◽

10.1889/1.1833829 ◽

1998 ◽

Vol 29 (1) ◽

pp. 601

Author(s):

Suk Jae Chung ◽

Eun Jung Han ◽

Jong Hyun Moon ◽

Myung Hwan Oh ◽

Jin Jang

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Electron Field Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

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Organo-Functionalization of Silicon Nanocrystals Synthesized by Inductively Coupled Plasma Chemical Vapor Deposition

Bulletin of the Korean Chemical Society ◽

10.1002/bkcs.10758 ◽

2016 ◽

Vol 37 (5) ◽

pp. 705-712

Author(s):

Don-Sung Lee ◽

Dong-Hoe Choe ◽

Seung-Wan Yoo ◽

Jung-Hyung Kim ◽

Hyun-Dam Jeong

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Silicon Nanocrystals ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Exploring High Refractive Index Silicon-Rich Nitride Films by Low-Temperature Inductively Coupled Plasma Chemical Vapor Deposition and Applications for Integrated Waveguides

ACS Applied Materials & Interfaces ◽

10.1021/acsami.5b06329 ◽

2015 ◽

Vol 7 (39) ◽

pp. 21884-21889 ◽

Author(s):

Doris K. T. Ng ◽

Qian Wang ◽

Ting Wang ◽

Siu-Kit Ng ◽

Yeow-Teck Toh ◽

...

Keyword(s):

Refractive Index ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

High Refractive Index ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Non-catalytic direct synthesis of graphene on Si (111) wafers by using inductively-coupled plasma chemical vapor deposition

Journal of the Korean Physical Society ◽

10.3938/jkps.69.536 ◽

2016 ◽

Vol 69 (4) ◽

pp. 536-540

Author(s):

Sung Won Hwang ◽

Hyunho Shin ◽

Bongsoo Lee ◽

Suk-Ho Choi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Direct Synthesis ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Enhanced Nucleation of Microcrystalline Silicon Thin Films Deposited by Inductively Coupled Plasma Chemical Vapor Deposition with Low-Frequency Pulse Substrate Bias

Japanese Journal of Applied Physics ◽

10.1143/jjap.49.050202 ◽

2010 ◽

Vol 49 (5) ◽

pp. 050202

Author(s):

Mamoru Furuta ◽

Takahiro Hiramatsu ◽

Takashi Hirao

Keyword(s):

Inductively Coupled Plasma ◽

Low Frequency ◽

Chemical Vapor ◽

Substrate Bias ◽

Microcrystalline Silicon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Frequency Pulse

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