Microstructures, mechanical and tribological properties of VN films deposited by PLD technique

RSC Advances ◽  
2016 ◽  
Vol 6 (40) ◽  
pp. 33403-33408 ◽  
Author(s):  
Hongjian Guo ◽  
Bo Li ◽  
Jianyi Wang ◽  
Wenyuan Chen ◽  
Zhenyu Zhang ◽  
...  
Keyword(s):  
Tribological Properties ◽  
Room Temperature ◽  
Laser Deposition ◽  
Vanadium Nitride ◽  
Deposition Technique ◽  
Mechanical And Tribological Properties

Consistent stoichiometric FCC structured vanadium nitride films were fabricated by plused laser deposition technique at room temperature and 300 °C, and their microstructures, mechanical and tribological properties were investigated.

The Effects of Substrate Temperature and Bias on the Structural, Mechanical and Tribological Properties of TiC films deposited by Magnetron Assisted Pulsed Laser Deposition

2001 ◽  
Vol 697 ◽  
Author(s):  
A.R. Phani ◽  
J.E. Krzanowski ◽  
J.J. Nainaparampil
Keyword(s):  
Substrate Temperature ◽  
Pulsed Laser Deposition ◽  
Tribological Properties ◽  
Room Temperature ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Indentation Hardness ◽  
Substrate Bias ◽  
X Ray ◽  
Mechanical And Tribological Properties

AbstractTitanium carbide films have been deposited using a hybrid magnetron sputtering/ pulsed laser deposition technique. One set of films was deposited at substrate temperatures ranging from room temperature to 600oC with no substrate bias, and a second set was deposited at 400°C bias voltages up to -150V. X-ray diffraction, X-ray photoelectron spectroscopy, and electron microscopy were employed for structural and compositional characterization of the films, and nano-indentation hardness testing and pin-on-disc wear tests were used to evaluate the mechanical and tribological properties. All the TiC films deposited without substrate bias were highly crystalline. The films deposited with bias had significantly reduced crystallinity and non-stoichiometric film compositions. The hardness of the TiC films increased with substrate temperature from 8 GPa at room temperature to 18 GPa at 600oC, whereas the biased films had a maximum hardness of 12 GPa. The wear test data showed significantly lower friction and longer wear life for the -150V biased film.

DEPENDENCE OF SECOND HARMONIC GENERATION ON SIZE OF NANOCRYSTALLITES OF ZnO

2001 ◽  
Vol 15 (15) ◽  
pp. 515-521 ◽  
Author(s):  
ANIRBAN MITRA ◽  
RAJ K. THAREJA
Keyword(s):  
Grain Size ◽  
Second Harmonic Generation ◽  
Harmonic Generation ◽  
Room Temperature ◽  
Second Harmonic ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Zno Thin Films ◽  
Deposition Technique ◽  
Ambient Oxygen

We report second harmonic generation (SHG) from ZnO thin films deposited by the pulsed laser deposition technique at ambient oxygen pressures ranging from 10 mTorr to 1 Torr on glass substrate at room temperature (RT). The dependence of SHG on grain size and thickness of the film is discussed.

Pulsed Laser Deposition of Poly(Tetrafluoroethylene) Films

1995 ◽  
Vol 397 ◽  
Author(s):  
D.L. Kjendal ◽  
Ashok Kumar ◽  
R.B. Inturi ◽  
J. A. Barnard
Keyword(s):  
Pulsed Laser Deposition ◽  
Room Temperature ◽  
High Vacuum ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Deposition Technique ◽  
Nano Indentation ◽  
Corning Glass ◽  
Deposition Parameters ◽  
Compositional Properties

ABSTRACTThin films of poly(tetrafluoroethylene) have been deposited on amorphous (7059 Corning Glass) and silicon(l00) substrates at various temperatures by the Pulsed Laser Deposition technique. The deposition was carried out at high vacuum (˜10-6 torr)at temperatures ranging from room temperature to 350°C. The mechanical properties of these films at the varying process temperatures have been evaluated by nano-indentation techniques and compositional properties of the films have been characterized by Fourier Transform Infrared spectroscopy. The deposition parameters have been optimized in order to produce good quality films.

UV EMISSION OF TETRAGONAL ZrO2 NANOCRYSTALS EMBEDDED IN ZrSiO4 AMORPHOUS MATRIX

2010 ◽  
Vol 24 (24) ◽  
pp. 2477-2483 ◽  
Author(s):  
ZHONGYANG GE ◽  
YUE ZHOU ◽  
JIANG YIN ◽  
YOUPIN GONG ◽  
SHICHENG LV ◽  
...  
Keyword(s):  
Room Temperature ◽  
Electronic Excitation ◽  
Amorphous Matrix ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Deposition Technique ◽  
Amorphous Films ◽  
Optical Absorbance ◽  
Uv Emission ◽  
Quartz Substrates

Amorphous films Zr 0.8 Si 0.2 O 2 were deposited on quartz substrates at room temperature, by using pulsed laser deposition technique. After annealing at high temperature, Zr 0.8 Si 0.2 O 2 films suffer a phase separation to precipitate tetragonal ZrO 2 nanocrystals in ZrSiO 4 amorphous matrix. Their crystal structure, microstructure, optical absorbance and photoluminescence have been systematically investigated. Tetragonal ZrO 2 nanocrystals show intense UV emission around 392 nm under photonic excitation with a wavelength of 250 nm. The corresponding models of electronic excitation and transition related to UV emission also have been proposed.

Crystalline vanadium nitride ultra-thin films obtained at room temperature by pulsed laser deposition

2012 ◽  
Vol 211 ◽  
pp. 158-162 ◽  
Author(s):  
C. Matei Ghimbeu ◽  
F. Sima ◽  
R.V. Ostaci ◽  
G. Socol ◽  
I.N. Mihailescu ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Room Temperature ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Vanadium Nitride
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