scholarly journals Resistive non-volatile memories fabricated with poly(vinylidene fluoride)/poly(thiophene) blend nanosheets

RSC Advances ◽  
2018 ◽  
Vol 8 (15) ◽  
pp. 7963-7968 ◽  
Author(s):  
Huie Zhu ◽  
Shunsuke Yamamoto ◽  
Jun Matsui ◽  
Tokuji Miyashita ◽  
Masaya Mitsuishi

Ferroelectric poly(vinylidene fluoride)/semiconductive polythiophene blend nanosheets show good resistive non-volatile memory performance with a fresh high ON/OFF ratio and long endurance to 30 days.

2015 ◽  
Vol 3 (10) ◽  
pp. 2366-2370 ◽  
Author(s):  
Ji Hoon Park ◽  
Narendra Kurra ◽  
M. N. AlMadhoun ◽  
Ihab N. Odeh ◽  
H. N. Alshareef

We report a simple two-step annealing scheme for the fabrication of stable non-volatile memory devices employing poly(vinylidene fluoride) (PVDF) polymer thin-films.


2010 ◽  
Vol 11 (5) ◽  
pp. 925-932 ◽  
Author(s):  
D. Mao ◽  
M.A. Quevedo-Lopez ◽  
H. Stiegler ◽  
B.E. Gnade ◽  
H.N. Alshareef

2011 ◽  
Vol 99 (1) ◽  
pp. 012901 ◽  
Author(s):  
Gwang-Geun Lee ◽  
Eisuke Tokumitsu ◽  
Sung-Min Yoon ◽  
Yoshihisa Fujisaki ◽  
Joo-Won Yoon ◽  
...  

2013 ◽  
Vol 30 (2) ◽  
pp. 134
Author(s):  
Hui FU ◽  
Jishan QIU ◽  
Ning CHONG ◽  
Yaqing WANG ◽  
Yuanyuan TIAN ◽  
...  

2007 ◽  
Vol 7 (1) ◽  
pp. 329-334 ◽  
Author(s):  
C. Y. Ng ◽  
T. P. Chen ◽  
J. I. Wong ◽  
M. Yang ◽  
T. S. Khor ◽  
...  

Non-volatile memory devices based on silicon nanocrystal synthesized with very low energy Si+ implantation are fabricated. Memory performance under various programming mechanisms including Fowler-Nordheim (FN), drain-bias channel-hot-electron (DCHE), and source-bias channel-hot-electron (SCHE) has been investigated. It is observed that the DCHE yields the largest memory window among the three programming mechanisms. The DCHE and SCHE have similar endurance characteristics, but the SCHE has a longer retention time than the DCHE. Both the DCHE and SCHE have a larger memory window, a better endurance and a longer retention time as compared to the FN. Explanations to the phenomena are given.


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