Effect of oxygen vacancy concentration on indium tungsten oxide UV-A photodetector

Oxygen Vacancy Concentration ◽

Uv Photodetector ◽

An indium tungsten oxide (IWO) ultraviolet (UV) photodetector was fabricated with radio frequency magnetron sputtering.

Tungsten oxide films by radio-frequency magnetron sputtering for near-infrared photonics

Optical Materials X ◽

10.1016/j.omx.2021.100093 ◽

2021 ◽

pp. 100093

Author(s):

Hao Chen ◽

Alessandro Chiasera ◽

Stefano Varas ◽

Osman Sayginer ◽

Cristina Armellini ◽

...

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Tungsten Oxide ◽

Near Infrared ◽

Oxide Films ◽

Radio Frequency Magnetron Sputtering

Combined effect of oxygen deficient point defects and Ni doping in radio frequency magnetron sputtering deposited ZnO thin films

Thin Solid Films ◽

10.1016/j.tsf.2014.03.038 ◽

2014 ◽

Vol 562 ◽

pp. 37-42 ◽

Cited By ~ 17

Author(s):

B. Saha ◽

N.S. Das ◽

K.K. Chattopadhyay

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Point Defects ◽

Combined Effect ◽

Zno Thin Films ◽

Ni Doping ◽

Effect of oxygen flow rate on the ultraviolet sensing properties of zinc oxide nanocolumn arrays grown by radio frequency magnetron sputtering

Ceramics International ◽

10.1016/j.ceramint.2015.11.083 ◽

2016 ◽

Vol 42 (3) ◽

pp. 4107-4119 ◽

Cited By ~ 18

Author(s):

M.H. Mamat ◽

M.F. Malek ◽

N.N. Hafizah ◽

M.N. Asiah ◽

A.B. Suriani ◽

...

Keyword(s):

Zinc Oxide ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Flow Rate ◽

Oxygen Flow Rate ◽

Oxygen Flow ◽

Sensing Properties ◽

Effect of oxygen to argon ratio on properties of (Ba,Sr)TiO3 thin films prepared by radio-frequency magnetron sputtering

Journal of Applied Physics ◽

10.1063/1.365665 ◽

1997 ◽

Vol 82 (7) ◽

pp. 3482-3487 ◽

Cited By ~ 128

Author(s):

M. S. Tsai ◽

S. C. Sun ◽

T. Y. Tseng

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Effect of Oxygen to Argon Ratio on Growth of Bi4Ti3O12Thin Films on Ir and IrO2Prepared by Radio-Frequency Magnetron Sputtering

Japanese Journal of Applied Physics ◽

10.1143/jjap.38.2827 ◽

1999 ◽

Vol 38 (Part 1, No. 5A) ◽

pp. 2827-2830 ◽

Cited By ~ 16

Author(s):

W. Jo ◽

S. M. Cho ◽

H. M. Lee ◽

D. C. Kim ◽

J. U. Bu

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Effect of oxygen flow rate on properties of Cu4O3 thin films fabricated by radio frequency magnetron sputtering

Journal of Applied Physics ◽

10.1063/1.5144205 ◽

2020 ◽

Vol 127 (8) ◽

pp. 085302 ◽

Cited By ~ 1

Author(s):

Md Abdul Majed Patwary ◽

Chun Yuen Ho ◽

Katsuhiko Saito ◽

Qixin Guo ◽

Kin Man Yu ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Flow Rate ◽

Oxygen Flow Rate ◽

Oxygen Flow ◽

Effect of Plused Negative Bias on Nucleation and Morphological Evolution of ZnO Films Deposited by Reactive Radio-frequency Magnetron Sputtering

Journal of Inorganic Materials ◽

10.3724/sp.j.1077.2009.00602 ◽

2009 ◽

Vol 24 (3) ◽

pp. 602-606 ◽

Cited By ~ 1

Author(s):

Wei-Jia FU ◽

Zhi-Wen LIU ◽

Jian-Feng GU ◽

Ming LIU ◽

Qing-Yu ZHANG

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Morphological Evolution ◽

Radio Frequency Magnetron Sputtering

Zno Films ◽

Negative Bias ◽

Effect of sputtering power on the properties of SiO2 films grown by radio frequency magnetron sputtering at room temperature

Optical and Quantum Electronics ◽

10.1007/s11082-020-02639-4 ◽

2021 ◽

Vol 53 (1) ◽

Author(s):

Changjiang Zhao ◽

Leran Zhao ◽

Juncheng Liu ◽

Zhigang Liu ◽

Yan Chen

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Room Temperature ◽

Sio2 Films ◽

Sputtering Power

Mechanical, tribological, anti-corrosion and anti-glass sticking properties of high-entropy TaNbSiZrCr carbide coatings prepared using radio-frequency magnetron sputtering

Materials Chemistry and Physics ◽

10.1016/j.matchemphys.2021.124741 ◽

2021 ◽

pp. 124741

Author(s):

W.H. Kao ◽

Y.L. Su ◽

J.H. Horng ◽

W.C. Wu

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

High Entropy ◽

Carbide Coatings

Nickel telluride vertically aligned thin film by radio-frequency magnetron sputtering for hydrogen evolution reaction

APL Materials ◽

10.1063/5.0024588 ◽

2020 ◽

Vol 8 (12) ◽

pp. 121104

Author(s):

Jeonghyeon Oh ◽

Ho Jun Park ◽

Arindam Bala ◽

Hee-Soo Kim ◽

Na Liu ◽

...

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Hydrogen Evolution ◽

Hydrogen Evolution Reaction ◽

Vertically Aligned