Interface electron polarization based high-k Al2O3/ZnO nanolaminates with excellent temperature stability and ultrahigh energy-storage density by atomic layer deposition

2019 ◽  
Vol 7 (17) ◽  
pp. 10303-10318
Author(s):  
Jin Li ◽  
Maowen Liu ◽  
Xiaofang Bi
Keyword(s):  
Energy Storage ◽  
Atomic Layer Deposition ◽  
Temperature Stability ◽  
Atomic Layer ◽  
Energy Storage Density ◽  
Ultrahigh Energy ◽  
Storage Density ◽  
Electron Polarization ◽  
Layer Deposition ◽  
High K

Interface electron polarization based high-k Al2O3/ZnO nanolaminates with excellent temperature stability and ultrahigh energy-storage density by atomic layer deposition.

Ozone-Based Atomic Layer Deposition of Crystalline V2O5 Films for High Performance Electrochemical Energy Storage

2012 ◽  
Vol 24 (7) ◽  
pp. 1255-1261 ◽  
Author(s):  
Xinyi Chen ◽  
Ekaterina Pomerantseva ◽  
Parag Banerjee ◽  
Keith Gregorczyk ◽  
Reza Ghodssi ◽  
...  
Keyword(s):  
Energy Storage ◽  
Atomic Layer Deposition ◽  
High Performance ◽  
Atomic Layer ◽  
Electrochemical Energy Storage ◽  
Layer Deposition ◽  
Electrochemical Energy

Atomic Layer Deposition of Zirconium-Based High-k Metal Gate Oxide: Effect of Si Containing Zr Precursor

2015 ◽  
Vol 15 (1) ◽  
pp. 382-385
Author(s):  
Jun Hee Cho ◽  
Sang-Ick Lee ◽  
Jong Hyun Kim ◽  
Sang Jun Yim ◽  
Hyung Soo Shin ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Gate Oxide ◽  
Metal Gate ◽  
Layer Deposition ◽  
High K
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