Electron-beam interaction with emission-line clouds in blazars

Instrument for bunch tilt measurements in linear collider is presented. Electron beam probe basic principles are described and method of bunch tilt measurements is discussed. The simulation results of testing beam interaction with tilted relativistic bunch are presented. Main components of the bunch tilt measurement error are determined.

Download Full-text

Formation Of Two-Dimensional Photonic Crystals With Cavities Arrays In Silicon

Siberian Journal of Physics ◽

10.54362/1818-7919-2016-11-1-88-93 ◽

2016 ◽

Vol 11 (1) ◽

pp. 88-93

Author(s):

Dmitriy Utkin ◽

Aleksandr Shklyaev ◽

Fedor Dultsev ◽

Aleksandr Latyshev

Keyword(s):

Electron Beam ◽

Photonic Crystals ◽

Electron Beam Lithography ◽

Spatial Distributions ◽

Two Dimensional ◽

Interference Effects ◽

Technological Parameters ◽

Beam Interaction ◽

Cavity Array ◽

Better Than

Specific aspects of finely focused electron beam interaction with the PMMA-950K resist for the fabrication of closely spaced holes having inhomogeneous spatial distributions are studied. The technological parameters for the creation of two-dimensional photonic crystals with microcavities (missing holes) arrays, which allow obtaining the lateral sizes of the structure within the accuracy better than 2 %, in silicon using electron-beam lithography are determined. Such holes fabrication accuracy is thought to be sufficient to study the interference effects of cavity array radiation in twodimensional photonic crystals.

Download Full-text

A Study of Amorphous Chalcogenides by Electron Microscopy and Analysis

Microscopy and Microanalysis ◽

10.1017/s1431927600023692 ◽

1998 ◽

Vol 4 (S2) ◽

pp. 714-715

Author(s):

A. G. Fitzgerald ◽

K. Mietzsch

Keyword(s):

Electron Microscopy ◽

Electron Beam ◽

Diffusion Process ◽

Electron Beam Lithography ◽

Interaction Process ◽

Metal Diffusion ◽

Process Understanding ◽

Amorphous Chalcogenides ◽

Potential Applications ◽

Beam Interaction

Amorphous chalcogenides films coated with certain metals are known to possess a remarkable sensitivity to radiation. Based on these effects they have found several important applications in the production of microcircuits, e.g. as resists in photo- and electron beam lithography. A variety of chalcogenides in combination with a range of metals has been extensively investigated with regard to potential applications in the fabrication of semiconductor devices.The objectives of the present project are to extend knowledge of the behaviour of amorphous chalcogenides in contact with metals. This includes studying the metal diffusion process, understanding the film-electron beam interaction process and evaluating the potential of the metal lines formed by the electron beam in fabrication of photomasks for the production of higher densities of silicon microcircuits.

Download Full-text