Chemical and structural analysis of crystalline carbon nitride thin films prepared by electron cyclotron resonance plasma sputtering process

Journal de Physique IV (Proceedings) ◽

10.1051/jp4:19998141 ◽

1999 ◽

Vol 09 (PR8) ◽

pp. Pr8-1131-Pr8-1137

Author(s):

Y. Tani ◽

Y. Aoi ◽

E. Kamijo

Keyword(s):

Structural Analysis ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Resonance Plasma

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The Structure and Bonding State for Fullerene-Like Carbon Nitride Films with High Hardness Formed by Electron Cyclotron Resonance Plasma Sputtering

Japanese Journal of Applied Physics ◽

10.1143/jjap.51.125602 ◽

2012 ◽

Vol 51 ◽

pp. 125602 ◽

Author(s):

Tomoyuki Kamata ◽

Osamu Niwa ◽

Shigeru Umemura ◽

Shigeru Hirono

Keyword(s):

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

High Hardness ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Bonding State ◽

Plasma Sputtering ◽

Structure And Bonding ◽

Resonance Plasma

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Optical Properties of c-Axis Oriented Ba2NaNb5O15 Thin Films Formed by Electron Cyclotron Resonance Plasma Sputtering

Journal of the Ceramic Society of Japan ◽

10.2109/jcersj.105.687 ◽

1997 ◽

Vol 105 (1224) ◽

pp. 687-689

Author(s):

Akira WATAZU ◽

Hiroshi MASUMOTO ◽

Yoichiro MASUDA ◽

Toshio HIRAI

Keyword(s):

Optical Properties ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Resonance Plasma

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Composition and crystal structure of carbon nitride films prepared by the electron cyclotron resonance plasma sputtering method

Applied Physics Letters ◽

10.1063/1.122235 ◽

1998 ◽

Vol 73 (12) ◽

pp. 1652-1654 ◽

Author(s):

Youji Tani ◽

Yoshifumi Aoi ◽

Eiji Kamijo

Keyword(s):

Crystal Structure ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Resonance Plasma

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Growth of preferentially c-axis oriented hydroxyapatite thin films on Si(1 0 0) substrate by electron-cyclotron-resonance plasma sputtering

Applied Surface Science ◽

10.1016/j.apsusc.2013.03.070 ◽

2013 ◽

Vol 276 ◽

pp. 217-222 ◽

Author(s):

Housei Akazawa ◽

Yuko Ueno

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Resonance Plasma

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Study on Deposition Method of ITO Thin Films with Large Area by Electron Cyclotron Resonance Plasma Sputtering.

Shinku ◽

10.3131/jvsj.44.272 ◽

2001 ◽

Vol 44 (3) ◽

pp. 272-275

Author(s):

Toshiaki YASUI ◽

Hirokazu TAHARA ◽

Takao YOSHIKAWA

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Deposition Method ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Ito Thin Films ◽

Resonance Plasma

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Electron cyclotron resonance plasma technology of silicon carbon nitride thin films

The Ninth International Conference on Advanced Semiconductor Devices and Mircosystems ◽

10.1109/asdam.2012.6418516 ◽

2012 ◽

Author(s):

J. Huran ◽

M. Kucera ◽

P. Bohacek ◽

A.P. Kobzev ◽

A. Kleinova ◽

...

Keyword(s):

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Technology ◽

Electron Cyclotron Resonance Plasma ◽

Silicon Carbon ◽

Resonance Plasma ◽

Silicon Carbon Nitride

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Zinc Oxide Thin Films Prepared by the Electron-Cyclotron-Resonance Plasma Sputtering Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.29.334 ◽

1990 ◽

Vol 29 (Part 1, No. 2) ◽

pp. 334-339 ◽

Author(s):

Yoshio Manabe ◽

Tsuneo Mitsuyu

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Oxide Thin Films ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Resonance Plasma

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Electron cyclotron resonance plasma-assisted pulsed laser deposition of carbon nitride thin films

10.1117/12.456844 ◽

2002 ◽

Author(s):

Wei Shi ◽

JiaDa Wu ◽

Jian Sun ◽

Hao Ling ◽

Zhifeng Ying ◽

...

Keyword(s):

Pulsed Laser Deposition ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Pulsed Laser ◽

Electron Cyclotron ◽

Laser Deposition ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Factors driving c-axis orientation and disorientation of LiNbO3 thin films deposited on TiN and indium tin oxide by electron cyclotron resonance plasma sputtering

Journal of Applied Physics ◽

10.1063/1.2204817 ◽

2006 ◽

Vol 99 (12) ◽

pp. 124103 ◽

Author(s):

H. Akazawa ◽

M. Shimada

Keyword(s):

Tin Oxide ◽

Indium Tin Oxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Axis Orientation ◽

Plasma Sputtering ◽

Resonance Plasma

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Highly conductive, undoped ZnO thin films deposited by electron-cyclotron-resonance plasma sputtering on silica glass substrate

Thin Solid Films ◽

10.1016/j.tsf.2009.06.008 ◽

2009 ◽

Vol 518 (1) ◽

pp. 22-26 ◽

Author(s):

Housei Akazawa

Keyword(s):

Glass Substrate ◽

Silica Glass ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Zno Thin Films ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Resonance Plasma

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