Optical Properties of c-Axis Oriented Ba2NaNb5O15 Thin Films Formed by Electron Cyclotron Resonance Plasma Sputtering

Journal of the Ceramic Society of Japan ◽

10.2109/jcersj.105.687 ◽

1997 ◽

Vol 105 (1224) ◽

pp. 687-689

Author(s):

Akira WATAZU ◽

Hiroshi MASUMOTO ◽

Yoichiro MASUDA ◽

Toshio HIRAI

Keyword(s):

Optical Properties ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Resonance Plasma

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Growth of preferentially c-axis oriented hydroxyapatite thin films on Si(1 0 0) substrate by electron-cyclotron-resonance plasma sputtering

Applied Surface Science ◽

10.1016/j.apsusc.2013.03.070 ◽

2013 ◽

Vol 276 ◽

pp. 217-222 ◽

Author(s):

Housei Akazawa ◽

Yuko Ueno

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Resonance Plasma

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Chemical and structural analysis of crystalline carbon nitride thin films prepared by electron cyclotron resonance plasma sputtering process

Journal de Physique IV (Proceedings) ◽

10.1051/jp4:19998141 ◽

1999 ◽

Vol 09 (PR8) ◽

pp. Pr8-1131-Pr8-1137

Author(s):

Y. Tani ◽

Y. Aoi ◽

E. Kamijo

Keyword(s):

Structural Analysis ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Resonance Plasma

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Study on Deposition Method of ITO Thin Films with Large Area by Electron Cyclotron Resonance Plasma Sputtering.

Shinku ◽

10.3131/jvsj.44.272 ◽

2001 ◽

Vol 44 (3) ◽

pp. 272-275

Author(s):

Toshiaki YASUI ◽

Hirokazu TAHARA ◽

Takao YOSHIKAWA

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Deposition Method ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Ito Thin Films ◽

Resonance Plasma

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Electron cyclotron resonance plasma enhanced chemical vapour deposition and optical properties of SiOx thin films

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(98)00362-7 ◽

1998 ◽

Vol 226 (1-2) ◽

pp. 58-66 ◽

Author(s):

Pavel V Bulkin ◽

Pieter L Swart ◽

Beatrys M Lacquet

Keyword(s):

Optical Properties ◽

Chemical Vapour Deposition ◽

Cyclotron Resonance ◽

Vapour Deposition ◽

Electron Cyclotron Resonance ◽

Chemical Vapour ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Zinc Oxide Thin Films Prepared by the Electron-Cyclotron-Resonance Plasma Sputtering Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.29.334 ◽

1990 ◽

Vol 29 (Part 1, No. 2) ◽

pp. 334-339 ◽

Author(s):

Yoshio Manabe ◽

Tsuneo Mitsuyu

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Oxide Thin Films ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Resonance Plasma

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Factors driving c-axis orientation and disorientation of LiNbO3 thin films deposited on TiN and indium tin oxide by electron cyclotron resonance plasma sputtering

Journal of Applied Physics ◽

10.1063/1.2204817 ◽

2006 ◽

Vol 99 (12) ◽

pp. 124103 ◽

Author(s):

H. Akazawa ◽

M. Shimada

Keyword(s):

Tin Oxide ◽

Indium Tin Oxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Axis Orientation ◽

Plasma Sputtering ◽

Resonance Plasma

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Highly conductive, undoped ZnO thin films deposited by electron-cyclotron-resonance plasma sputtering on silica glass substrate

Thin Solid Films ◽

10.1016/j.tsf.2009.06.008 ◽

2009 ◽

Vol 518 (1) ◽

pp. 22-26 ◽

Author(s):

Housei Akazawa

Keyword(s):

Glass Substrate ◽

Silica Glass ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Zno Thin Films ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Resonance Plasma

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Preparation of strontium titanate thin films by mirror-confinement-type electron cyclotron resonance plasma sputtering

Thin Solid Films ◽

10.1016/s0040-6090(01)00940-3 ◽

2001 ◽

Vol 390 (1-2) ◽

pp. 70-75 ◽

Author(s):

So Baba ◽

Ken Numata ◽

Hidenori Saito ◽

Masao Kumagai ◽

Toshiyuki Ueno ◽

...

Keyword(s):

Strontium Titanate ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Resonance Plasma

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Dielectric Permittivity of Amorphous and Hexagonal Electron Cyclotron Resonance Plasma Deposited Ta[sub 2]O[sub 5] Thin Films

Electrochemical and Solid-State Letters ◽

10.1149/1.1390814 ◽

1999 ◽

Vol 2 (6) ◽

pp. 291 ◽

Author(s):

C. Chaneliere

Keyword(s):

Dielectric Permittivity ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Preparation of Bismuth Titanate Films by Electron Cyclotron Resonance Plasma Sputtering-Chemical Vapor Deposition

Journal de Physique IV (Proceedings) ◽

10.1051/jphyscol:1995580 ◽

1995 ◽

Vol 05 (C5) ◽

pp. C5-671-C5-677

Author(s):

H. Masumoto ◽

T. Hirai

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Bismuth Titanate ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Resonance Plasma

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