Powder‐free plasma chemical vapor deposition of hydrogenated amorphous silicon with high rf power density using modulated rf discharge

Vapor Deposition ◽

Chemical Vapor ◽

Rf Discharge ◽

Rf Power ◽

Plasma Chemical ◽

Hydrogenated Amorphous ◽

Free Plasma

Dependence of RF Power Bias on Hydrogenated Amorphous Silicon by High-Density Plasma Chemical Vapor Deposition

ECS Meeting Abstracts ◽

10.1149/ma2005-02/24/883 ◽

2005 ◽

Keyword(s):

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Rf Power ◽

Plasma Chemical ◽

Hydrogenated Amorphous ◽

Density Plasma

HIGH RATE DEPOSITION OF HYDROGENATED AMORPHOUS SILICON USING MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION PROCESS

Le Journal de Physique Colloques ◽

10.1051/jphyscol:1989578 ◽

1989 ◽

Vol 50 (C5) ◽

pp. C5-667-C5-672

Author(s):

DING-KUN PENG ◽

CHUN-LIN WANG ◽

GUANG-YAO MENG

Keyword(s):

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Process ◽

High Rate ◽

Plasma Chemical ◽

In situ optical diagnosis on hydrogenated amorphous silicon grown by vibration superimposed plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.114284 ◽

1995 ◽

Vol 66 (9) ◽

pp. 1071-1073 ◽

Cited By ~ 5

Author(s):

Nobuo Naito ◽

Akihiro Takano ◽

Masatomo Sumiya ◽

Masashi Kawasaki ◽

Hideomi Koinuma

Keyword(s):

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Optical Diagnosis ◽

Plasma Chemical ◽

Influence of RF Bias on Hydrogenated Amorphous Silicon by High-Density Plasma Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.2713723 ◽

2007 ◽

Vol 154 (5) ◽

pp. G122 ◽

Cited By ~ 9

Author(s):

Wen-Chu Hsiao ◽

Chuan-Pu Liu ◽

Ying-Lang Wang

Keyword(s):

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Density ◽

Plasma Chemical ◽

Hydrogenated Amorphous ◽

Density Plasma

Thermal properties of hydrogenated amorphous silicon prepared by high-density plasma chemical vapor deposition

Journal of Physics and Chemistry of Solids ◽

10.1016/j.jpcs.2007.07.095 ◽

2008 ◽

Vol 69 (2-3) ◽

pp. 648-652 ◽

Cited By ~ 4

Author(s):

Wen-Chu Hsiao ◽

Chuan-Pu Liu ◽

Ying-Lang Wang

Keyword(s):

Thermal Properties ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Hydrogenated Amorphous ◽

Density Plasma

Effect of HeatingSiH4on the Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Silicon

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.4373 ◽

1994 ◽

Vol 33 (Part 1, No. 7B) ◽

pp. 4373-4376 ◽

Cited By ~ 5

Author(s):

Yoshihiro Hishikawa ◽

Manabu Sasaki ◽

Sadaji Tsuge ◽

Shinya Tsuda

Keyword(s):

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Effect of Ar+Ion Bombardment During Hydrogenated Amorphous Silicon Film Growth in Plasma Chemical Vapor Deposition System

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.6404 ◽

2000 ◽

Vol 39 (Part 1, No. 11) ◽

pp. 6404-6409 ◽

Cited By ~ 4

Author(s):

Isamu Kato ◽

Yuuki Nakano ◽

Nobuhiko Yamaguchi

Keyword(s):

Vapor Deposition ◽

Film Growth ◽

Silicon Film ◽

Chemical Vapor ◽

Plasma Chemical ◽

Amorphous Silicon Film ◽

Photoluminescence from Thermally Oxidized Hydrogenated Amorphous Silicon Nanoball Films Fabricated by Double-Tubed-Coaxial-Line-Type Microwave Plasma Chemical Vapor Deposition System

Japanese Journal of Applied Physics ◽

10.1143/jjap.40.6862 ◽

2001 ◽

Vol 40 (Part 1, No. 12) ◽

pp. 6862-6867 ◽

Cited By ~ 2

Author(s):

Isamu Kato ◽

Takayuki Matsumoto ◽

O. P. Agnihotri

Keyword(s):

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Coaxial Line ◽

Plasma Chemical ◽

Hydrogenated Amorphous ◽

Line Type

Stable hydrogenated amorphous silicon films deposited from silane and dichlorosilane by radio frequency plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.113612 ◽

1995 ◽

Vol 66 (8) ◽

pp. 965-967 ◽

Cited By ~ 12

Author(s):

Ian S. Osborne ◽

Nobuhiro Hata ◽

Akihisa Matsuda

Keyword(s):

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Plasma Chemical ◽

Frequency Plasma ◽

Mechanism of plasma chemical-vapor deposition of hydrogenated amorphous silicon

Current Topics in Amorphous Materials ◽

10.1016/b978-0-444-81576-7.50054-x ◽

1993 ◽

pp. 345-350 ◽

Cited By ~ 1

Author(s):

Akihisa Matsuda

Keyword(s):

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽