Photoluminescence from Thermally Oxidized Hydrogenated Amorphous Silicon Nanoball Films Fabricated by Double-Tubed-Coaxial-Line-Type Microwave Plasma Chemical Vapor Deposition System

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Coaxial Line ◽

Plasma Chemical ◽

Hydrogenated Amorphous ◽

Line Type

HIGH RATE DEPOSITION OF HYDROGENATED AMORPHOUS SILICON USING MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION PROCESS

Le Journal de Physique Colloques ◽

10.1051/jphyscol:1989578 ◽

1989 ◽

Vol 50 (C5) ◽

pp. C5-667-C5-672

Author(s):

DING-KUN PENG ◽

CHUN-LIN WANG ◽

GUANG-YAO MENG

Keyword(s):

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Process ◽

High Rate ◽

Plasma Chemical ◽

In situ optical diagnosis on hydrogenated amorphous silicon grown by vibration superimposed plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.114284 ◽

1995 ◽

Vol 66 (9) ◽

pp. 1071-1073 ◽

Cited By ~ 5

Author(s):

Nobuo Naito ◽

Akihiro Takano ◽

Masatomo Sumiya ◽

Masashi Kawasaki ◽

Hideomi Koinuma

Keyword(s):

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Optical Diagnosis ◽

Plasma Chemical ◽

Influence of RF Bias on Hydrogenated Amorphous Silicon by High-Density Plasma Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.2713723 ◽

2007 ◽

Vol 154 (5) ◽

pp. G122 ◽

Cited By ~ 9

Author(s):

Wen-Chu Hsiao ◽

Chuan-Pu Liu ◽

Ying-Lang Wang

Keyword(s):

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Density ◽

Plasma Chemical ◽

Hydrogenated Amorphous ◽

Density Plasma

Thermal properties of hydrogenated amorphous silicon prepared by high-density plasma chemical vapor deposition

Journal of Physics and Chemistry of Solids ◽

10.1016/j.jpcs.2007.07.095 ◽

2008 ◽

Vol 69 (2-3) ◽

pp. 648-652 ◽

Cited By ~ 4

Author(s):

Wen-Chu Hsiao ◽

Chuan-Pu Liu ◽

Ying-Lang Wang

Keyword(s):

Thermal Properties ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Hydrogenated Amorphous ◽

Density Plasma

Effect of HeatingSiH4on the Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Silicon

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.4373 ◽

1994 ◽

Vol 33 (Part 1, No. 7B) ◽

pp. 4373-4376 ◽

Cited By ~ 5

Author(s):

Yoshihiro Hishikawa ◽

Manabu Sasaki ◽

Sadaji Tsuge ◽

Shinya Tsuda

Keyword(s):

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Effect of Ar+Ion Bombardment During Hydrogenated Amorphous Silicon Film Growth in Plasma Chemical Vapor Deposition System

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.6404 ◽

2000 ◽

Vol 39 (Part 1, No. 11) ◽

pp. 6404-6409 ◽

Cited By ~ 4

Author(s):

Isamu Kato ◽

Yuuki Nakano ◽

Nobuhiko Yamaguchi

Keyword(s):

Vapor Deposition ◽

Film Growth ◽

Silicon Film ◽

Chemical Vapor ◽

Plasma Chemical ◽

Amorphous Silicon Film ◽

Preparation of silicon nitride films at room temperature using double‐tubed coaxial line‐type microwave plasma chemical vapor deposition system

Journal of Applied Physics ◽

10.1063/1.339772 ◽

1987 ◽

Vol 62 (2) ◽

pp. 492-497 ◽

Cited By ~ 21

Author(s):

Isamu Kato ◽

Kazuto Noguchi ◽

Kouji Numada

Keyword(s):

Silicon Nitride ◽

Vapor Deposition ◽

Room Temperature ◽

Microwave Plasma ◽

Chemical Vapor ◽

Coaxial Line ◽

Plasma Chemical ◽

Silicon Nitride Films ◽

Line Type

Effects of flow ratios on surface morphology and structure of hydrogenated amorphous carbon films prepared by microwave plasma chemical vapor deposition

Applied Surface Science ◽

10.1016/j.apsusc.2009.06.111 ◽

2009 ◽

Vol 255 (22) ◽

pp. 9058-9061 ◽

Cited By ~ 5

Author(s):

S.B. Yang ◽

F.M. Pan ◽

Y.E. Yang ◽

W.C. Zhang

Keyword(s):

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Morphology And Structure ◽

Effects of deposition gas pressure on the properties of hydrogenated amorphous carbon nitride films grown by surface wave microwave plasma chemical vapor deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2004.12.040 ◽

2005 ◽

Vol 14 (3-7) ◽

pp. 975-982 ◽

Cited By ~ 9

Author(s):

M. Rusop ◽

A.M.M. Omer ◽

S. Adhikari ◽

S. Adhikary ◽

H. Uchida ◽

...

Keyword(s):

Surface Wave ◽

Vapor Deposition ◽

Carbon Nitride ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Amorphous Carbon Nitride ◽

Stable hydrogenated amorphous silicon films deposited from silane and dichlorosilane by radio frequency plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.113612 ◽

1995 ◽

Vol 66 (8) ◽

pp. 965-967 ◽

Cited By ~ 12

Author(s):

Ian S. Osborne ◽

Nobuhiro Hata ◽

Akihisa Matsuda

Keyword(s):

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Plasma Chemical ◽

Frequency Plasma ◽