Etch mechanism in the low refractive index silicon nitride plasma‐enhanced chemical vapor deposition process
1988 ◽
Vol 9
(3)
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pp. 237-249
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1993 ◽
Vol 140
(12)
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pp. 3588-3590
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2011 ◽
Vol 115
(37)
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pp. 10290-10298
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2014 ◽
Vol 53
(22)
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pp. 9076-9087
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