Growth of high quality single‐domain single‐crystal films of PbTiO3

1994 ◽  
Vol 65 (9) ◽  
pp. 1106-1108 ◽  
Author(s):  
Z. Li ◽  
C. M. Foster ◽  
D. Guo ◽  
H. Zhang ◽  
G. R. Bai ◽  
...  
1998 ◽  
Vol 517 ◽  
Author(s):  
M. Levy ◽  
R.M. Osgood ◽  
A. Kumar ◽  
H. Bakhru ◽  
R. Liu ◽  
...  

AbstractThe epitaxial separation of single-crystal magnetic and ferroelectric oxide films is presented. Ion implantation is used to create a buried damage layer beneath the surface. The high etch-selectivity of this sacrificial layer makes it possible to detach high quality single-crystal films from bulk samples. Magnetic and electrical properties of the films are discussed.


Nanomaterials ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 473
Author(s):  
Shao Xin Yan ◽  
Chang Bao Han ◽  
Jianhua Huang ◽  
Yichuan Chen ◽  
Xiaobo Zhang ◽  
...  

Organic–inorganic perovskite single crystals are promising in the field of optoelectronics due to their excellent optoelectronic properties. However, the ion transport of perovskite precursor is poor in confined spaces, which results in difficulty in the preparation of perovskite single-crystal films. Herein, MAPbBr3 films consisting of square grains were fabricated by the surface-confined process using the organic molecule PEAI (phenethylammonium iodide). Under the effect of oversaturation gradient, PEA+ is combined with the surface of perovskite grain from top to side, which constrains the lateral growth of grains and induces a downward growth of perovskite, leading to the formation of square grains. With the improvement of concentration PEAI, the perovskite film exhibits a decreased side length of grains (from 0.98 to 12.96 μm) and increased grain number and coverage, as well as crystallinity. The perovskite single crystalline grain films with PEAI showed double photoluminescence (PL) emission peaks due to the existence of iodine-rich perovskite. This work may provide a practical way to fabricate high-quality perovskite films for perovskite photoelectronic devices.


1981 ◽  
Vol 10 ◽  
Author(s):  
R. T. Tung ◽  
J. M. Poate ◽  
J. C. Bean ◽  
J. M. Gibson ◽  
D. C. Jacobson

The formation and structures of epitaxial CoSi2, NiSi2, Pd2 Si and PtSi films on silicon are reviewed. Polycrystalline films of reasonable epitaxial quality can be grown with sharp interfaces on Si(111) by conventional deposition and heating techniques. The interfaces on (100) substrates, however, are faceted. Perfect singlecrystal CoSi2 films can be grown on Si(111) substrates by ultrahigh vacuum techniques using conventional deposition and annealing at about 900°C and molecular beam epitaxy codeposition at about 600°C. The single-crystal films are rotated 180° with respect to the substrate. Novel defect arrays are observed at the interface. Resistivities in epitaxial films are lower than those reported in polycrystalline layers. High quality silicon films can be grown on the silicides to form semiconductor/metal/semiconductor heterostructures.


Author(s):  
L. E. Murr ◽  
G. Wong

Palladium single-crystal films have been prepared by Matthews in ultra-high vacuum by evaporation onto (001) NaCl substrates cleaved in-situ, and maintained at ∼ 350° C. Murr has also produced large-grained and single-crystal Pd films by high-rate evaporation onto (001) NaCl air-cleaved substrates at 350°C. In the present work, very large (∼ 3cm2), continuous single-crystal films of Pd have been prepared by flash evaporation onto air-cleaved (001) NaCl substrates at temperatures at or below 250°C. Evaporation rates estimated to be ≧ 2000 Å/sec, were obtained by effectively short-circuiting 1 mil tungsten evaporation boats in a self-regulating system which maintained an optimum load current of approximately 90 amperes; corresponding to a current density through the boat of ∼ 4 × 104 amperes/cm2.


2001 ◽  
Vol 27 (6) ◽  
pp. 451-453 ◽  
Author(s):  
S. S. Kucherenko ◽  
V. P. Pashchenko ◽  
P. I. Polyakov ◽  
S. I. Khartsev ◽  
V. A. Shtaba

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