Deep level defects in Mg‐doped, p‐type GaN grown by metalorganic chemical vapor deposition

1996 ◽  
Vol 68 (24) ◽  
pp. 3470-3472 ◽  
Author(s):  
W. Götz ◽  
N. M. Johnson ◽  
D. P. Bour
1999 ◽  
Vol 38 (Part 1, No. 2A) ◽  
pp. 631-634 ◽  
Author(s):  
Doo-Hyeb Youn ◽  
Mohamed Lachab ◽  
Maosheng Hao ◽  
Tomoya Sugahara ◽  
Hironori Takenaka ◽  
...  

2000 ◽  
Vol 76 (9) ◽  
pp. 1149-1151 ◽  
Author(s):  
K. S. Kim ◽  
M. G. Cheong ◽  
C.-H. Hong ◽  
G. M. Yang ◽  
K. Y. Lim ◽  
...  

1995 ◽  
Vol 378 ◽  
Author(s):  
Z. C. Huang ◽  
Bing Yang ◽  
H. K. Chen ◽  
J. C. Chen

ABSTRACTWe have achieved deep-level-free Al0.22Ga0.78As epitaxial layers using low selenium (Se)-doping (8.4 × l016 cm−3) grown by metalorganic chemical vapor deposition (MOCVD). Deep levels in various Al0.22Ga0.78As layers grown on GaAs substrates were measured by deep level transient spectroscopy (DLTS). We have found that the commonly observed oxygen contamination-related deep levels at EC-0.53 and 0.70 eV and germanium-related level at EC-0.30 eV in MOCVD-grown Al0.22Ga0.78 As can be eliminated by low Se-doping. In addition, a deep hole level located at Ev+0.65 eV was found for the first time in highly Se-doped Al0.22Ga0.78 As epilayers. We suggest that low Se-doping (<2 × 1017 cm−3) produces a passivation effect and then deactivates other deep levels in Al0.22Ga0.78As.


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