Study of charge control and gate tunneling in a ferroelectric-oxide-silicon field effect transistor: Comparison with a conventional metal-oxide-silicon structure
2013 ◽
Vol 13
(2)
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pp. 771-775
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2019 ◽
Vol 11
(10)
◽
pp. 903-906
Keyword(s):
2003 ◽
Vol 42
(Part 1, No. 8)
◽
pp. 4998-5001
Keyword(s):
Keyword(s):