scholarly journals Hydrogen depth-profiling in chemical-vapor-deposited diamond films by high-resolution elastic recoil detection

2001 ◽  
Vol 78 (12) ◽  
pp. 1679-1681 ◽  
Author(s):  
Kenji Kimura ◽  
Kaoru Nakajima ◽  
Sadanori Yamanaka ◽  
Masataka Hasegawa ◽  
Hideyo Okushi
Keyword(s):  
High Resolution ◽  
Diamond Films ◽  
Depth Profiling ◽  
Chemical Vapor ◽  
Elastic Recoil ◽  
Elastic Recoil Detection ◽  
Chemical Vapor Deposited

Elastic Recoil Detection Analysis for Hydrogen near the Surface of Chemical-Vapor-Deposited Diamond

1995 ◽  
Vol 34 (Part 2, No. 5A) ◽  
pp. L577-L579 ◽  
Author(s):  
Hiromasa Yagi ◽  
Kazuo Tanida ◽  
Kazuhito Nishimura ◽  
Akimitsu Hatta ◽  
Toshimichi Ito ◽  
...  
Keyword(s):  
Chemical Vapor ◽  
Elastic Recoil ◽  
Elastic Recoil Detection Analysis ◽  
Elastic Recoil Detection ◽  
Detection Analysis ◽  
Chemical Vapor Deposited

Crystalline perfection of chemical vapor deposited diamond films

1990 ◽  
Vol 5 (8) ◽  
pp. 1591-1594 ◽  
Author(s):  
A. V. Hetherington ◽  
C. J. H. Wort ◽  
P. Southworth
Keyword(s):  
Grain Boundaries ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Stacking Faults ◽  
Chemical Vapor ◽  
Cvd Diamond ◽  
Growth Conditions ◽  
Crystalline Perfection ◽  
Planar Defects ◽  
Chemical Vapor Deposited

The crystalline perfection of microwave plasma assisted chemical vapor deposited (MPACVD) diamond films grown under various conditions has been examined by TEM. Most CVD diamond films thus far reported contain a high density of defects, predominantly twins and stacking faults on {111} planes. We show that under appropriate growth conditions, these planar defects are eliminated from the center of the crystallites, and occur only at grain boundaries where the growing crystallites meet.

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