scholarly journals Thermal stability of plasma-nitrided aluminum oxide films on Si

2004 ◽  
Vol 84 (1) ◽  
pp. 97-99 ◽  
Author(s):  
K. P. Bastos ◽  
R. P. Pezzi ◽  
L. Miotti ◽  
G. V. Soares ◽  
C. Driemeier ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Aluminum Oxide ◽  
Oxide Films ◽  
Thermal Stability Of

Thermal Stability of Sputtered Iridium Oxide Films

1989 ◽  
Vol 136 (6) ◽  
pp. 1740-1743 ◽  
Author(s):  
R. Sanjinés ◽  
A. Aruchamy ◽  
F. Lévy
Keyword(s):  
Thermal Stability ◽  
Oxide Films ◽  
Iridium Oxide ◽  
Thermal Stability Of

Microstructure, hardness, resistivity and thermal stability of sputtered oxide films of AlCoCrCu0.5NiFe high-entropy alloy

2007 ◽  
Vol 457 (1-2) ◽  
pp. 77-83 ◽  
Author(s):  
Yuan-Sheng Huang ◽  
Ling Chen ◽  
Hong-Wei Lui ◽  
Ming-Hong Cai ◽  
Jien-Wei Yeh
Keyword(s):  
Thermal Stability ◽  
Oxide Films ◽  
High Entropy Alloy ◽  
High Entropy ◽  
Thermal Stability Of

Thermal stability of sputtered zirconium oxide films

Vacuum ◽  
2004 ◽  
Vol 75 (1) ◽  
pp. 7-16 ◽  
Author(s):  
S. Venkataraj ◽  
O. Kappertz ◽  
Ch. Liesch ◽  
R. Detemple ◽  
R. Jayavel ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Zirconium Oxide ◽  
Oxide Films ◽  
Thermal Stability Of

scholarly journals The surface structure matters: thermal stability of phthalic acid anchored to atomically-defined cobalt oxide films

2016 ◽  
Vol 18 (15) ◽  
pp. 10419-10427 ◽  
Author(s):  
Tao Xu ◽  
Matthias Schwarz ◽  
Kristin Werner ◽  
Susanne Mohr ◽  
Max Amende ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Surface Structure ◽  
Cobalt Oxide ◽  
Atomic Structure ◽  
Phthalic Acid ◽  
Oxide Films ◽  
Oxide Surfaces ◽  
Thermal Stability Of

The atomic structure of cobalt oxide surfaces influence the ordering and thermal stability of anchored phthalic acid.

Thermal Stability of Hg1-xCdxTe Crystals Covered with the Anodic Oxide Films

1986 ◽  
Vol 25 (Part 1, No. 12) ◽  
pp. 1862-1864 ◽  
Author(s):  
Kôki Takita ◽  
Takashi Ippōshi ◽  
Kouichi Murakami ◽  
Kohzoh Masuda ◽  
Hiroshi Kudo ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Oxide Films ◽  
Anodic Oxide ◽  
Anodic Oxide Films ◽  
Thermal Stability Of

Mechanisms for the enhancement of the thermal stability of organic thin films by aluminum oxide capping layers

2006 ◽  
Vol 21 (2) ◽  
pp. 455-464 ◽  
Author(s):  
S. Sellner ◽  
A. Gerlach ◽  
F. Schreiber ◽  
M. Kelsch ◽  
N. Kasper ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Aluminum Oxide ◽  
Elevated Temperatures ◽  
Organic Thin Films ◽  
Organic Films ◽  
Capping Layer ◽  
Ambient Gases ◽  
Complementary Techniques ◽  
Thermal Stability Of

We present a detailed study of the thermal stability of organic thin films of diindenoperylene encapsulated by sputtered aluminum oxide layers. We studied the influence of capping layer thickness, stoichiometry, and heating rate on the thermal stability of capped films and their eventual breakdown. Under optimized encapsulation conditions (thick and stoichiometric capping layer), the organic films desorb only at temperatures 200 °C above the desorption of the uncapped film. Moreover, the capped organic films retain their crystalline order at these elevated temperatures, whereas they would normally (i.e., uncapped) be in the gas phase. This study therefore also shows a way of studying organic materials under temperature conditions normally inaccessible. Considering results from complementary techniques, we discuss possible scenarios for the eventual breakdown. The results have implications for the performance and long-term stability of organic devices for which stability against elevated temperatures as well as against exposure to ambient gases is crucial.

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