Capacitance-voltage studies on enhancement-mode InGaAs metal-oxide-semiconductor field-effect transistor using atomic-layer-deposited Al2O3 gate dielectric

2006 ◽  
Vol 88 (26) ◽  
pp. 263518 ◽  
Author(s):  
Y. Xuan ◽  
H. C. Lin ◽  
P. D. Ye ◽  
G. D. Wilk
Sign in / Sign up

Export Citation Format

Share Document