Correlations between structural and electrical properties of nitrided SiOx thin films used as power metal oxide semiconductor field effect transistor gate dielectric
2008 ◽
Vol 29
(9)
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pp. 977-980
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2011 ◽
Vol 29
(3)
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pp. 03C122
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2010 ◽
Vol 49
(12)
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pp. 124202
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1996 ◽
Vol 35
(Part 1, No. 5A)
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pp. 2590-2594
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