Correlations between structural and electrical properties of nitrided SiOx thin films used as power metal oxide semiconductor field effect transistor gate dielectric

2008 ◽  
Vol 93 (18) ◽  
pp. 182109
Author(s):  
E. Fazio ◽  
F. Neri ◽  
G. Curró M. Camalleri ◽  
D. Calí
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