Heteroepitaxial growth of Nb-doped SrTiO3 films on Si substrates by pulsed laser deposition for resistance memory applications

2007 ◽  
Vol 90 (5) ◽  
pp. 052110 ◽  
Author(s):  
Wenfeng Xiang ◽  
Rui Dong ◽  
Dongsoo Lee ◽  
Seokjoon Oh ◽  
Dongjun Seong ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Heteroepitaxial Growth ◽  
Si Substrates ◽  
Memory Applications

Excimer pulsed laser deposition and annealing of YSZ nanometric films on Si substrates

2005 ◽  
Vol 248 (1-4) ◽  
pp. 270-275 ◽  
Author(s):  
A.P. Caricato ◽  
G. Barucca ◽  
A. Di Cristoforo ◽  
G. Leggieri ◽  
A. Luches ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Si Substrates

Characteristics of SrBi2Ta2O9 thin films prepared by pulsed laser deposition for non-volatile memory applications

2000 ◽  
Vol 375 (1-2) ◽  
pp. 200-204 ◽  
Author(s):  
Xinhua Zhu ◽  
Yiming Liu ◽  
Zhenghua An ◽  
Tao Zhu ◽  
Zhuangchun Wu ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Non Volatile Memory ◽  
Volatile Memory ◽  
Memory Applications

Dynamics of STO heteroepitaxial growth by pulsed laser deposition

2005 ◽  
Vol 40 (19) ◽  
pp. 5139-5145 ◽  
Author(s):  
X. Z. Liu ◽  
S. M. He ◽  
D. H. Li ◽  
Q. F. Lu ◽  
Z. H. Wang ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Heteroepitaxial Growth

Heteroepitaxial growth of Sr1.8Ca0.2NaNb5O15/Li0.25Ni0.75O/MgO by pulsed laser deposition

2015 ◽  
Vol 594 ◽  
pp. 299-303 ◽  
Author(s):  
W.C. Liu ◽  
Y.B. Yao ◽  
X.S. Wu ◽  
F.M. Zhang ◽  
C.L. Mak
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Heteroepitaxial Growth

Characterization of low resistivity Ga-doped ZnO thin films on Si substrates prepared by pulsed laser deposition

2019 ◽  
Vol 6 (10) ◽  
pp. 106421
Author(s):  
Guankong Mo ◽  
Jiahui Liu ◽  
Guotao Lin ◽  
Zhuoliang Zou ◽  
Zeqi Wei ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Zno Thin Films ◽  
Low Resistivity ◽  
Si Substrates ◽  
Doped Zno

Low Temperature Growth Of Barium Strontium Titanate Films By Ultraviolet-Assisted Pulsed Laser Deposition

2000 ◽  
Vol 617 ◽  
Author(s):  
V. Craciun ◽  
J. M. Howard ◽  
E. S. Lambers ◽  
R. K. Singh
Keyword(s):  
Pulsed Laser Deposition ◽  
Strontium Titanate ◽  
Barium Strontium Titanate ◽  
Photoelectron Spectroscopy ◽  
Perovskite Phase ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Flat Band ◽  
Si Substrates ◽  
Barium Strontium

AbstractBarium strontium titanate (BST) thin films were grown directly on Si substrates by an in situ ultraviolet (UV)-assisted pulsed laser deposition (UVPLD) technique. With respect to films grown by conventional (i.e. without UV illumination) pulsed laser deposition (PLD), the UVPLD grown films exhibited improved structural and electrical properties. The dielectric constant of a 40-nm thick film deposited at 650 °C was determined to be 281, the leakage current density was approximately 4×10−8 A/cm2at 100 kV/cm, and the density of interface states at the flat-band voltage was found to be approximately 5.6×1011 eV−1 cm−2 X-ray photoelectron spectroscopy investigations found that the surface of the grown films exhibited an additional Ba-containing phase, besides the usual BST perovskite phase, which was likely caused by stress and/or oxygen vacancies. The amount of this new phase was always smaller and very superficial for UVPLD grown films, which can explain their better overall properties.

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