Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
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2016 ◽
Vol 6
(1)
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pp. P38-P41
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2012 ◽
Vol 30
(1)
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pp. 01A162
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2014 ◽
Vol 12
(1-2)
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pp. 238-241
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2007 ◽
Vol 28
(12)
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pp. 1089-1091
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